Dual-wavelength method for measuring the thickness of HSQ photoresist

被引：0
|
作者：
Yao Shun [1 ]
Yu Bo [1 ]
Jin Jingcheng [1 ]
Li Chun [1 ]
机构：
[1] Chinese Acad Sci, Changchun Inst Opt & Fine Mech, State Key Lab Appl Opt, Changchun 130033, Peoples R China
来源：
8TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGY: OPTICAL TEST, MEASUREMENT TECHNOLOGY, AND EQUIPMENT | 2016年 / 9684卷
关键词：
Dual-wavelength method; Photoresist; Spectroscopic ellipsometer;
D O I：
10.1117/12.2246196
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The reflectivity of thin film changes periodically with the increase of its thickness. According to this effect, we present a dual-wavelength method for measuring the thickness of HSQ film. At first, the refractive index of HSQ was measured by a spectroscopic ellipsometer. Then the relationship between the thickness of HSQ and the reflectivity was deduced. At last, the thickness of HSQ was calculated using the reflectivity measured by a spectrograph. The method was proved to be simple and effective.
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页数：6
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