UV laser photolysis of butenedial from 193 to 450 nm

被引：0
|
作者：
Tang, YX
Zhu, L
机构：
[1] SUNY Albany, Dept Environm Hlth & Toxicol, New York State Dept Hlth, Albany, NY 12201 USA
[2] New York State Dept Hlth, Wadsworth Ctr, New York, NY USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 230卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：U2905 / U2905
页数：1
相关论文
共 50 条
  • [21] Numerical modeling of the formation of a laser UV (193 nm) induced plasma
    Parisse, JD
    Zeitoun, DE
    Marine, W
    Sentis, ML
    JOURNAL DE PHYSIQUE IV, 2001, 11 (PR7): : 111 - 112
  • [22] ZnO ablation by UV laser (193 nm): Nanoaggregates in gaseous state
    Ozerov, I
    Bulgakov, A
    Nelson, D
    Castell, R
    Sentis, M
    Marine, W
    JOURNAL DE PHYSIQUE IV, 2003, 108 : 37 - 40
  • [23] ETHYLENE PHOTOLYSIS AT 147-193 NM
    POTZINGER, P
    VONBUNAU, G
    GLASGOW, LC
    ZEITSCHRIFT FUR NATURFORSCHUNG PART A-ASTROPHYSIK PHYSIK UND PHYSIKALISCHE CHEMIE, 1972, A 27 (04): : 628 - +
  • [24] FORMATION OF HOT HEXAFLUOROBENZENE IN THE 193 NM PHOTOLYSIS
    ICHIMURA, T
    MORI, Y
    NAKASHIMA, N
    YOSHIHARA, K
    CHEMICAL PHYSICS LETTERS, 1984, 104 (06) : 533 - 537
  • [25] Improved UV-fiber for 193 nm excimer laser applications
    Karlitschek, P
    Klein, KF
    Hillrichs, G
    Grzesik, U
    BIOMEDICAL FIBER OPTICS, PROCEEDINGS OF, 1996, 2677 : 127 - 134
  • [26] PHOTOLYSIS AND QUANTUM YIELD OF CARBONYLCHLOROFLUORIDE AT 193 NM
    HERMANN, M
    NOLLE, A
    HEYDTMANN, H
    CHEMICAL PHYSICS LETTERS, 1994, 226 (5-6) : 559 - 562
  • [27] PHOTOLYSIS OF FN3 AT 193 NM
    PATEL, D
    PRITT, AT
    BENARD, DJ
    JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (09): : 1931 - 1934
  • [28] H ATOM GENERATION FROM THE 193-NM PHOTOLYSIS OF TRIETHYLGALLIUM
    DESHMUKH, S
    BRUM, JL
    KOPLITZ, B
    JOURNAL OF PHYSICAL CHEMISTRY, 1991, 95 (02): : 720 - 722
  • [29] UV LASER PHOTOLYSIS OF C3O2 AT 193-NM - EMISSION FROM ELECTRONICALLY EXCITED C, CO AND C-2
    UMEMOTO, M
    SHINOHARA, H
    NISHI, N
    SHIMADA, R
    JOURNAL OF PHOTOCHEMISTRY, 1982, 20 (04): : 277 - 286
  • [30] UV and gas interactions in an enclosed 193nm excimer laser beamline
    Elliott, DJ
    Camp, JC
    Harlow, WC
    Dosoretz, V
    Behr, D
    Callahan, GP
    Flint, S
    EXCIMER LASERS, OPTICS, AND APPLICATIONS, 1997, 2992 : 51 - 63
12345