Fluorinated CYTOP passivation effects on the electrical reliability of multilayer MoS2 field-effect transistors

被引:50
|
作者
Roh, Jeongkyun [1 ]
Cho, In-Tak [1 ]
Shin, Hyeonwoo [1 ]
Baek, Geun Woo [2 ]
Hong, Byung Hee [3 ]
Lee, Jong-Ho [1 ]
Jin, Sung Hun [2 ]
Lee, Changhee [1 ]
机构
[1] Seoul Natl Univ, Inter Univ Semicond Res Ctr, Dept Elect & Comp Engn, Seoul 151742, South Korea
[2] Incheon Natl Univ, Dept Elect Engn, Acad Ro, Inchon 406772, South Korea
[3] Seoul Natl Univ, Dept Chem, Seoul 151742, South Korea
基金
新加坡国家研究基金会;
关键词
molybdenum disulfide; CYTOP passivation; field-effect transistors; THIN-FILM TRANSISTORS; HIGH-MOBILITY; SOL-GEL; HYSTERESIS; VOLTAGE;
D O I
10.1088/0957-4484/26/45/455201
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We demonstrated highly stable multilayer molybdenum disulfide (MoS2) field-effect transistors (FETs) with negligible hysteresis gap (Delta V-HYS similar to 0.15 V) via a multiple annealing scheme, followed by systematic investigation for long-term air stability with time (similar to 50 days) of MoS2 FETs with (or without) CYTOP encapsulation. The extracted lifetime of the device with CYTOP passivation in air was dramatically improved from 7 to 377 days, and even for the short-term bias stability, the experimental threshold voltage shift, outstandingly well-matched with the stretched exponential function, indicates that the device without passivation has approximately 25% larger the barrier distribution (Delta E-B = k(B)T(o)) than that of a device with passivation. This work suggests that CYTOP encapsulation can be an efficient method to isolate external gas (O-2 and H2O) effects on the electrical performance of FETs, especially with low-dimensional active materials like MoS2.
引用
收藏
页数:7
相关论文
共 50 条
  • [1] Effects of plasma treatment on the electrical reliability of multilayer MoS2 field-effect transistors
    Lee, Boung Jun
    Lee, Byung Jun
    Lee, Jongchan
    Yang, Ji-Woon
    Kwon, Kwang-Ho
    [J]. THIN SOLID FILMS, 2017, 637 : 32 - 36
  • [2] Bias Temperature Stress Instability of Multilayered MoS2 Field-Effect Transistors With CYTOP Passivation
    Seo, Seung Gi
    Jin, Sung Hun
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (05) : 2208 - 2213
  • [3] Effects of Various Passivation Layers on Electrical Properties of Multilayer MoS2 Transistors
    Ma, Jiyeon
    Yoo, Geonwook
    [J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2018, 18 (09) : 5982 - 5985
  • [4] Fluorinated Graphene Contacts and Passivation Layer for MoS2 Field Effect Transistors
    Ryu, Huije
    Kim, Dong-Hyun
    Kwon, Junyoung
    Park, Sang Kyu
    Lee, Wanggon
    Seo, Hyungtak
    Watanabe, Kenji
    Taniguchi, Takashi
    Kim, SunPhil
    Zande, Arend M.
    Son, Jangyup
    Lee, Gwan-Hyoung
    [J]. ADVANCED ELECTRONIC MATERIALS, 2022, 8 (10)
  • [5] Electrical breakdown of multilayer MoS2 field-effect transistors with thickness-dependent mobility
    Yang, Rui
    Wang, Zenghui
    Feng, Philip X. -L.
    [J]. NANOSCALE, 2014, 6 (21) : 12383 - 12390
  • [6] Separation of interlayer resistance in multilayer MoS2 field-effect transistors
    Na, Junhong
    Shin, Minju
    Joo, Min-Kyu
    Huh, Junghwan
    Kim, Yun Jeong
    Choi, Hyung Jong
    Shim, Joon Hyung
    Kim, Gyu-Tae
    [J]. APPLIED PHYSICS LETTERS, 2014, 104 (23)
  • [7] Low-frequency noise in multilayer MoS2 field-effect transistors: the effect of high-k passivation
    Na, Junhong
    Joo, Min-Kyu
    Shin, Minju
    Huh, Junghwan
    Kim, Jae-Sung
    Piao, Mingxing
    Jin, Jun-Eon
    Jang, Ho-Kyun
    Choi, Hyung Jong
    Shim, Joon Hyung
    Kim, Gyu-Tae
    [J]. NANOSCALE, 2014, 6 (01) : 433 - 441
  • [8] Abnormal device performance in transferred multilayer MoS2 field-effect transistors
    Tong, Ling
    Ma, Jingyi
    Chen, Xinyu
    Guo, Xiaojiao
    Gou, Saifei
    Xia, Yin
    Wang, Die
    Chen, Honglei
    Bao, Wenzhong
    [J]. 2021 INTERNATIONAL SEMICONDUCTOR CONFERENCE (CAS), 2021, : 187 - 190
  • [9] Effect of Thickness and Thermal Treatment on the Electrical Performance of 2D MoS2 Monolayer and Multilayer Field-Effect Transistors
    B. A. Muñiz Martínez
    Mario Flores Salazar
    M. G. Syamala Rao
    Andrés de Luna Bugallo
    R. Ramirez-Bon
    [J]. Journal of Electronic Materials, 2024, 53 : 2124 - 2134
  • [10] Impact of device scaling on the electrical properties of MoS2 field-effect transistors
    Arutchelvan, Goutham
    Smets, Quentin
    Verreck, Devin
    Ahmed, Zubair
    Gaur, Abhinav
    Sutar, Surajit
    Jussot, Julien
    Groven, Benjamin
    Heyns, Marc
    Lin, Dennis
    Asselberghs, Inge
    Radu, Iuliana
    [J]. SCIENTIFIC REPORTS, 2021, 11 (01)