Electrical breakdown of multilayer MoS2 field-effect transistors with thickness-dependent mobility

被引:72
|
作者
Yang, Rui [1 ]
Wang, Zenghui [1 ]
Feng, Philip X. -L. [1 ]
机构
[1] Case Western Reserve Univ, Case Sch Engn, Dept Elect Engn & Comp Sci, Cleveland, OH 44106 USA
关键词
FEW-LAYER MOS2; MOLYBDENUM-DISULFIDE; HIGH-PERFORMANCE; INTEGRATED-CIRCUITS; MONOLAYER; TRANSITION; SCATTERING;
D O I
10.1039/c4nr03472d
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report on the experimental investigation and modeling of electrical breakdown in multilayer (a few to tens of nanometers thick) molybdenum disulfide (MoS2) field-effect transistors (FETs). By measuring MoS2 devices ranging from 5.7 nm to 77 nm in thicknesses, we achieve a breakdown current of 1.2 mA, mobility of 42 cm(2) V-1 s(-1), and on/off current ratio I-On/I-Off similar to 10(7). Through measurements and simulations, we find the dependence of the breakdown current limit on MoS2 thicknesses, channel lengths and conductivities. We also explore, both experimentally and analytically, the effects of different device parameters upon carrier mobility, which is directly related to the current carrying capacity. The results suggest that, compared to single-layer devices, multilayer MoS2 FETs could be advantageous for circuit applications requiring higher carrier mobility and power handling capacities.
引用
收藏
页码:12383 / 12390
页数:8
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