Differences in Emission Spectra of Dislocations in 4H-SiC Epitaxial Layers

被引:25
|
作者
Liu, Kendrick X. [1 ]
Zhang, X. [2 ]
Stahlbush, R. E. [1 ]
Skowronski, M. [2 ]
Caldwell, J. D. [1 ]
机构
[1] USN, Res Lab, 4555 Overlook Ave,SW, Washington, DC 20375 USA
[2] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
关键词
Photoluminescence (PL); luminescence imaging; luminescence spectra; dislocations; partial dislocations; threading dislocations; threading edge dislocations; threading screw dislocations; extended defects; silicon carbide; SiC; 4H-SiC; DIODES;
D O I
10.4028/www.scientific.net/MSF.600-603.345
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Material defects such as Si-core and C-core partial dislocations (PDs) and threading screw dislocations (TSDs) and threading edge dislocations (TEDs) are being investigated for their contributions to device performances in 4H-SiC. Non-destructive electroluminescence and photo luminescence techniques can be powerful tools for examining these dislocations. In this report, these techniques were used to reveal the different spectral characteristics for the mentioned dislocations. At higher injection levels, both the Si-core and C-core PDs possessed a spectral peak at 700 nm. However, at lower injection levels, the spectral peak for the Si-core PD remained at 700 nm while the peak for the C-core moved to longer wavelengths. For the threading dislocations, TSDs possessed a peak between 800 and 850 nm while the TEDs possessed a peak at 600 nm independent of the injection levels.
引用
收藏
页码:345 / +
页数:2
相关论文
共 50 条
  • [31] Dislocation Formation in Epitaxial film by Propagation of Shallow Dislocations on 4H-SiC substrate
    Ishikawa, Y.
    Sato, K.
    Okamoto, Y.
    Hayashi, N.
    Yao, Y.
    Sugawara, Y.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 383 - +
  • [32] Structural transformation of screw dislocations via thick 4H-SiC epitaxial growth
    Kamata, I
    Tsuchida, H
    Jikimoto, T
    Izumi, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12A): : 6496 - 6500
  • [33] Growth of thick epitaxial 4H-SiC layers by chemical vapor deposition
    Kordina, O
    Irvine, K
    Sumakeris, J
    Kong, HS
    Paisley, MJ
    Carter, CH
    [J]. SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 107 - 110
  • [34] Laser Annealing of P and Al Implanted 4H-SiC Epitaxial Layers
    Calabretta, Cristiano
    Agati, Marta
    Zimbone, Massimo
    Boninelli, Simona
    Castiello, Andrea
    Pecora, Alessandro
    Fortunato, Guglielmo
    Calcagno, Lucia
    Torrisi, Lorenzo
    La Via, Francesco
    [J]. MATERIALS, 2019, 12 (20)
  • [35] Kinetics of residual doping in 4H-SiC epitaxial layers grown in vacuum
    Kakanakova-Georgieva, A
    Yakimova, R
    Gueorguiev, GK
    Linnarsson, MK
    Syväjärvi, M
    Janzén, E
    [J]. JOURNAL OF CRYSTAL GROWTH, 2002, 240 (3-4) : 501 - 507
  • [36] Structure of in-grown stacking faults in the 4H-SiC epitaxial layers
    Izumi, S
    Tsuchida, H
    Tawara, T
    Kamata, I
    Izumi, K
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2004, 2005, 483 : 323 - 326
  • [37] Gettering effect with Al implanted into 4H-SiC CVD epitaxial layers
    Kalinina, E
    Kholujanov, G
    Sitnikova, A
    Kossov, V
    Yafaev, R
    Pensl, G
    Reshanov, S
    Hallén, A
    Konstantinov, A
    [J]. SILICON CARBIDE AND RELATED MATERIALS - 2002, 2002, 433-4 : 637 - 640
  • [38] Influence of ion implantation on the quality of 4H-SiC CVD epitaxial layers
    Kalinina, E
    Kholujanov, G
    Solov'ev, V
    Strel'chuk, A
    Kossov, V
    Yafaev, R
    Kovarskii
    Shchukarev, A
    Obyden, S
    Saparin, G
    Ivannikov, P
    Hallén, A
    Konstantinov, A
    [J]. APPLIED SURFACE SCIENCE, 2001, 184 (1-4) : 323 - 329
  • [39] Influence of the facet trace region in 4H-SiC substrate on the glide and propagation behaviors of basal plane dislocations in 4H-SiC homoepitaxial layers
    Izawa, Takuto
    Okano, Hirono
    Morita, Shintaro
    Ohtani, Noboru
    [J]. JOURNAL OF APPLIED PHYSICS, 2021, 130 (09)
  • [40] Influence of Substrate Preparation and Epitaxial Growth Parameters on the Dislocation Densities in 4H-SiC Epitaxial Layers
    Kallinger, B.
    Thomas, B.
    Friedrich, J.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 : 143 - +