Nitrogen stability measurements in sputtered iron nitride thin films by thermal desorption spectrometry

被引：14

作者：

Chatbi, H

Vergnat, M

Bobo, JF

Hennet, L

机构：

[1] Lab. Metall. Phys. et Sci. des Mat., U.R.A. au C.N.R.S. no 155, Univ. Henri Ponicare Nancy 1, 54506 Vanduvre-les-Nancy Cedex

来源：

SOLID STATE COMMUNICATIONS | 1997年 / 102卷 / 09期

关键词：

magnetic films and multilayers; phase transitions;

D O I：

10.1016/S0038-1098(97)00066-5

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Different phases of iron nitrides were prepared by reactive sputtering. The release of nitrogen and the crystallographic transformations during annealing were monitored by thermal desorption spectrometry and X-ray diffraction experiments. Finally, the diffusivity of nitrogen in the gamma'-Fe4N phase was evaluated. (C) 1997 Elsevier Science Ltd.

引用

页码：677 / 679

页数：3

共 50 条

[1] Stability of nitrogen in sputtered iron nitride thin films and multilayers
Chatbi, H
Vergnat, M
Bobo, JF
Hennet, L
MAGNETIC ULTRATHIN FILMS, MULTILAYERS AND SURFACES - 1997, 1997, 475 : 309 - 314
[2] THE EVOLUTION OF SPUTTERED IRON NITRIDE THIN-FILMS UNDER THERMAL-TREATMENT
MOSCA, DH
TEIXEIRA, SR
DIONISIO, PH
BAUMVOL, IJR
SCHREINER, WH
MONTEIRO, WA
JOURNAL OF APPLIED PHYSICS, 1991, 69 (01) : 261 - 267
[3] Thermal stability of copper nitride thin films: The role of nitrogen migration
Gonzalez-Arrabal, R.
Gordillo, N.
Martin-Gonzalez, M. S.
Ruiz-Bustos, R.
Agullo-Lopez, F.
JOURNAL OF APPLIED PHYSICS, 2010, 107 (10)
[4] Thermal stability of nitride thin films
Hultman, L
VACUUM, 2000, 57 (01) : 1 - 30
[5] Nitrogen profiles of thin sputtered PVD silicon nitride films
Markwitz, A., 1600, (44): : 3 - 4
[6] Nitride formation in iron-cobalt sputtered thin films
Pain, P
Chartier, P
Dinhut, JF
THIN SOLID FILMS, 1996, 272 (01) : 33 - 37
[7] Thermal stability of carbon nitride thin films
Hellgren, N
Lin, N
Broitman, E
Serin, V
Grillo, SE
Twesten, R
Petrov, I
Colliex, C
Hultman, L
Sundgren, JE
JOURNAL OF MATERIALS RESEARCH, 2001, 16 (11) : 3188 - 3201
[8] Thermal stability of carbon nitride thin films
Niklas Hellgren
Nian Lin
Esteban Broitman
Virginie Serin
Stefano E. Grillo
Ray Twesten
Ivan Petrov
Christian Colliex
Lars Hultman
Jan-Eric Sundgren
Journal of Materials Research, 2001, 16 : 3188 - 3201
[9] NITROGEN PROFILES OF THIN SPUTTERED PVD SILICON-NITRIDE FILMS
MARKWITZ, A
BAUMANN, H
KRIMMEL, EF
ROSE, M
BETHGE, K
MISAELIDES, P
LOGOTHETIDIS, S
VACUUM, 1993, 44 (3-4) : 367 - 370
[10] Improved thermal stability of nitrogen annealed sputtered hafnium oxide thin films for VLSI technology
Nahar, R. K.
Singh, Vikram
MICROELECTRONICS INTERNATIONAL, 2010, 27 (02) : 93 - 97

← 1 2 3 4 5 →