Development and approbation of nanoscalpels based probes for atomic force microscopy in the field of plasmonics

被引：0
|
作者：
Zhukov, M. V. [1 ,2 ]
Mukhin, I. S. [1 ,3 ]
Golubok, A. O. [1 ,2 ]
机构：
[1] ITMO Univ, Dept Mat Sci & Nanotechnol, Kronverkskiy Pr 49, St Petersburg 197101, Russia
[2] RAS, Inst Analyt Instrumentat, Dept Scanning Probe Microscope & Spect, Ivan Chernykh 31-33, St Petersburg 198095, Russia
[3] St Petersburg Acad Univ, RAS, Lab Renewable Energy Source, Khlopina 8-3, St Petersburg 194021, Russia
来源：
18TH RUSSIAN YOUTH CONFERENCE ON PHYSICS OF SEMICONDUCTORS AND NANOSTRUCTURES, OPTO- AND NANOELECTRONICS | 2017年 / 816卷
基金：
俄罗斯基础研究基金会;
关键词：
D O I：
10.1088/1742-6596/816/1/012037
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The formation and approbation of the specialized nanoscalpel (NS) probes were carried out. The possibility of producing diffraction gratings on gold substrates for plasmonics applications was shown. The optimal lithography parameters were revealed by using NS probes. It was shown that NS probes allow improving the lithography results such as the depth and width of the incisions as compared to standard probes.
引用
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页数：6
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