Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition

被引:23
|
作者
Hozumi, A
Sekoguchi, H
Kakinoki, N
Takai, O
机构
[1] Dept. of Mat. Processing Engineering, Nagoya University, Chikusa-ku
关键词
Contact Angle; Water Drop; Water Repellency; Substrate Position; Chemical Bonding State;
D O I
10.1023/A:1018699101677
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Preparation of transparent water-repellent films was carried out using th ree kinds of fluoroalkyl silanes (FASs) by radio-frequency plasma-enhanced chemical vapour deposition. The effects of the reaction conditions on the structures and properties of the films were studied. The films prepared showed high water repellency like poly(tetrafluoroethylene). The contact angles for water drops were about 107 degrees. The obtained contact angles depended on the length of perfluoroalkyl groups (CnF2n+1-) in FASs. Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy were used to investigate the film properties. The existence of the fluorine-containing groups such as -CF3, -CF2- and > CF- was confirmed at the fi Im surfaces. The contact angle decreased when oxygen was added to the plasma because of the decrease in the fluorine concentration in the deposited films by the decomposition of C-F bonds. The transmittance of the polycarbonate substrates coated using FASs was improved. The films also acted as an antireflective coating.
引用
收藏
页码:4253 / 4259
页数:7
相关论文
共 50 条
  • [1] Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition
    A HOZUMI
    H SEKOGUCHI
    N KAKINOKI
    O TAKAI
    [J]. Journal of Materials Science, 1997, 32 : 4253 - 4259
  • [2] Coating of transparent water-repellent thin films by plasma-enhanced CVD
    Takai, O
    Hozumi, A
    Sugimoto, N
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1997, 218 : 280 - 285
  • [3] Preparation of ultra water-repellent films by microwave plasma-enhanced CVD
    Hozumi, A
    Takai, O
    [J]. THIN SOLID FILMS, 1997, 303 (1-2) : 222 - 225
  • [4] Synthesis of graphene on a polycrystalline Co film by radio-frequency plasma-enhanced chemical vapour deposition
    Wang, S. M.
    Pei, Y. H.
    Wang, X.
    Wang, H.
    Meng, Q. N.
    Tian, H. W.
    Zheng, X. L.
    Zheng, W. T.
    Liu, Y. C.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (45)
  • [5] Low temperature deposition of transparent ultra water-repellent thin films by microwave plasma enhanced chemical vapor deposition
    Wu, YY
    Inoue, Y
    Sugimura, H
    Takai, O
    [J]. ADVANCED BIOMATERIALS-CHARACTERIZATION, TISSUE ENGINEERING AND COMPLEXITY, 2002, 711 : 283 - 288
  • [6] Fullerene-like carbon nanoparticles generated by radio-frequency plasma-enhanced chemical vapour deposition
    Burden, AP
    Silva, SRP
    [J]. PHILOSOPHICAL MAGAZINE LETTERS, 1998, 78 (01) : 15 - 19
  • [7] Preparation of silicon oxide films having a water-repellent layer by multiple-step microwave plasma-enhanced chemical vapor deposition
    Hozumi, A
    Takai, O
    [J]. THIN SOLID FILMS, 1998, 334 (1-2) : 54 - 59
  • [9] Transparent water-repellent films containing fluoro-alkyl functions by RF plasma-enhanced CVD
    Hozumi, A
    Sekoguchi, H
    Sugimoto, N
    Takai, O
    [J]. TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1998, 76 : 51 - 53
  • [10] Preparation of cobalt oxide films by plasma-enhanced metalorganic chemical vapour deposition
    Fujii, E
    Torii, H
    Tomozawa, A
    Takayama, R
    Hirao, T
    [J]. JOURNAL OF MATERIALS SCIENCE, 1995, 30 (23) : 6013 - 6018