Kilovolt AlGaN/GaN HEMTs as switching devices

被引:0
|
作者
Zhang, NQ [1 ]
Moran, B
DenBaars, SP
Mishra, UK
Wang, XW
Ma, TP
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2] Yale Univ, Ctr Microelct Mat & Struct, New Haven, CT 06520 USA
关键词
D O I
10.1002/1521-396X(200111)188:1<213::AID-PSSA213>3.3.CO;2-#
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
SiC devices have been the focus for several years as potential high voltage switches working at high temperature with very low on-resistance. Another competitive candidate for this application is the GaN HEMT (high electron mobility transistor). GaN has slightly wider bandgap, higher electric strength, and higher saturated velocity than SiC. The most prominent is that by utilizing the AlGaN/GaN heterojunction, the GaN HEMT has much higher charge density (up to 2 x 10(13) cm(-2)) and mobility (up to 2200 cm(2)/VS) in the channel compared to SiC MOSFET or JFET, yielding much lower on-resistance than SiC devices. GaN grown on SiC substrate also takes the advantage of high thermal conductivity of SiC. A GaN HEMT with a breakdown voltage of 1050 V was fabricated with a specific on-resistance of 3.4 m Ohm cm 2 and current density of 4 kA cm(-2). State-of-art power device figure of merit of V-BR(2)/R-on = 3.24 x 10(8) [V(2)Ohm (-1)cm(-2)] was achieved on this device. Projected performance of GaN HEMTs is also discussed and compared with SiC devices in this paper.
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页码:213 / 217
页数:5
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