Electromagnetic Properties at Millimeter Wavelength Range of Diamond Films Grown by DC arc Plasma Jet Technique

被引：0
|
作者：
Garin, B. M. [1 ]
Parshin, V. V. [1 ]
Serov, E. A. [1 ]
Jia, Ch. Ch. [1 ]
Tang, W. Z. [1 ]
Lu, F. X. [1 ]
机构：
[1] Russian Acad Sci, Inst Radio Engn & Elect, Fryazino Branch, 1 Vvedensky Sq, Fryazino 141190, Moscow Region, Russia
来源：
PIERS 2011 SUZHOU: PROGRESS IN ELECTROMAGNETICS RESEARCH SYMPOSIUM | 2011年
基金：
俄罗斯基础研究基金会;
关键词：
CVD DIAMONDS; DIELECTRIC LOSS; CONDUCTIVITY; LOSSES;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The results of investigation of the diamond sample prepared by using the DC arc plasma jet technique operated under a gas-recycling mode with deposition rate of about 10 mkm/hr is presented. The measuring methods at the base of high-Q open resonator and cylindrical cavity resonator are discussed. The absorption mechanism in Diamonds growing by different methods also discussed.
引用
收藏
页码：455 / 457
页数：3
相关论文
共 50 条
  • [31] Microstructure and fracture strength of different grades of freestanding diamond films deposited by a DC Arc Plasma Jet process
    Yang, JX
    Li, CM
    Lu, FX
    Chen, GC
    Tang, WZ
    Tong, YM
    SURFACE & COATINGS TECHNOLOGY, 2005, 192 (2-3): : 171 - 176
  • [32] High-rate synthesis of highly oriented diamond films on silicon by DC arc plasma jet CVD
    Higa, A
    Hatta, A
    Ito, T
    Toguchi, M
    Hiraki, A
    DIAMOND FILMS AND TECHNOLOGY, 1996, 6 (05): : 277 - 282
  • [33] Purification of diamond films by applying current into the plasma stream in the arc discharge plasma jet chemical vapor deposition technique
    1600, American Inst of Physics, Woodbury, NY, USA (77):
  • [34] Homoepitaxial diamond synthesis by DC arc plasma jet chemical vapor deposition
    Higa, A
    Hatta, A
    Ito, T
    Maehama, T
    Toguchi, M
    Hiraki, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (5A): : L577 - L580
  • [35] DC-ARC PLASMA DEPOSITION OF SMOOTH NANOCRYSTALLINE DIAMOND FILMS
    KONOV, VI
    SMOLIN, AA
    RALCHENKO, VG
    PIMENOV, SM
    OBRAZTSOVA, ED
    LOUBNIN, EN
    METEV, SM
    SEPOLD, G
    DIAMOND AND RELATED MATERIALS, 1995, 4 (08) : 1073 - 1078
  • [36] PRODUCTION AND CHARACTERIZATION OF DC AND HF PLASMA-JET DIAMOND FILMS
    VERVEN, G
    PRIEM, T
    PAIDASSI, S
    BLEIN, F
    BIANCHI, L
    DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) : 468 - 475
  • [37] Preparation of carbon nitride films by DC arc plasma jet CVD
    Yamazato, M.
    Higa, A.
    Oshiro, T.
    Toyama, H.
    Maehama, T.
    Toguchi, M.
    DIAMOND AND RELATED MATERIALS, 2006, 15 (4-8) : 917 - 920
  • [38] Diamond films grown by millimeter wave plasma-assisted CVD reactor
    Vikharev, A. L.
    Gorbachev, A. M.
    Kozlov, A. V.
    Koldanov, V. A.
    Litvak, A. G.
    Ovechkin, N. M.
    Radishev, D. B.
    Bykov, Yu. V.
    Caplan, M.
    DIAMOND AND RELATED MATERIALS, 2006, 15 (4-8) : 502 - 507
  • [39] Free-standing diamond films deposited by DC arc plasma jet on graphite substrates with a destroyable Ti interlayer
    Li, Chengming
    Wang, Limei
    Chen, Liangxian
    Liu, Zheng
    Hei, Lifu
    Lu, Fanxiu
    DIAMOND AND RELATED MATERIALS, 2009, 18 (11) : 1348 - 1352
  • [40] High temperature thermal conductivity of free-standing diamond films prepared by DC arc plasma jet CVD
    Zhu, R. H.
    Miao, J. Y.
    Liu, J. L.
    Chen, L. X.
    Guo, J. C.
    Hua, C. Y.
    Ding, T.
    Lian, H. K.
    Li, C. M.
    DIAMOND AND RELATED MATERIALS, 2014, 50 : 55 - 59
12345