Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

被引：120

作者：

Varel, H ^{[1
]}

Ashkenasi, D ^{[1
]}

Rosenfeld, A ^{[1
]}

Herrmann, R ^{[1
]}

Noack, F ^{[1
]}

Campbell, EEB ^{[1
]}

机构：

[1] FREE UNIV BERLIN,FACHBEREICH PHYS,D-14195 BERLIN,GERMANY

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1996年 / 62卷 / 03期

关键词：

D O I：

10.1007/BF01575098

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

引用

页码：293 / 294

页数：2

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