Enhanced field emission of plasma treated multilayer graphene

被引：60

作者：

Khare, Ruchita T. ^{[1
]}

Gelamo, Rogerio V. ^{[2
]}

More, Mahendra A. ^{[1
]}

Late, Dattatray J. ^{[3
]}

Rout, Chandra Sekhar ^{[4
]}

机构：

[1] SP Pune Univ, Ctr Adv Studies Mat Sci & Condensed Matter Phys, Dept Phys, Pune 411007, Maharashtra, India

[2] Univ Fed Triangulo Mineiro, Inst Ciencias Tecnol & Exatas, BR-38025180 Uberaba, MG, Brazil

[3] CSIR, Natl Chem Lab, Phys & Mat Chem Div, Pune 411008, Maharashtra, India

[4] Indian Inst Technol, Sch Basic Sci, Bhubaneswar 751013, Orissa, India

来源：

APPLIED PHYSICS LETTERS | 2015年 / 107卷 / 12期

关键词：

IRRADIATION; RAMAN;

D O I：

10.1063/1.4931626

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron emission properties of multilayer graphene (MLG) prepared by a facile exfoliation technique have been studied. Effect of CO2 Ar, N-2, plasma treatment was studied using Raman spectroscopy and investigated for field emission based application. The CO2 plasma treated multilayer graphene shows an enhanced field emission behavior with a low turn on field of 0.18 V/mu m and high emission current density of 1.89 mA/cm(2) at an applied field of 0.35 V/mu m. Further the plasma treated MLG exhibits excellent current stability at a lower and higher emission current value. (C) 2015 AIP Publishing LLC.

引用

页数：4

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