Enhanced field emission of plasma treated multilayer graphene

被引：60
|
作者：
Khare, Ruchita T. [1 ]
Gelamo, Rogerio V. [2 ]
More, Mahendra A. [1 ]
Late, Dattatray J. [3 ]
Rout, Chandra Sekhar [4 ]
机构：
[1] SP Pune Univ, Ctr Adv Studies Mat Sci & Condensed Matter Phys, Dept Phys, Pune 411007, Maharashtra, India
[2] Univ Fed Triangulo Mineiro, Inst Ciencias Tecnol & Exatas, BR-38025180 Uberaba, MG, Brazil
[3] CSIR, Natl Chem Lab, Phys & Mat Chem Div, Pune 411008, Maharashtra, India
[4] Indian Inst Technol, Sch Basic Sci, Bhubaneswar 751013, Orissa, India
来源：
APPLIED PHYSICS LETTERS | 2015年 / 107卷 / 12期
关键词：
IRRADIATION; RAMAN;
D O I：
10.1063/1.4931626
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Electron emission properties of multilayer graphene (MLG) prepared by a facile exfoliation technique have been studied. Effect of CO2 Ar, N-2, plasma treatment was studied using Raman spectroscopy and investigated for field emission based application. The CO2 plasma treated multilayer graphene shows an enhanced field emission behavior with a low turn on field of 0.18 V/mu m and high emission current density of 1.89 mA/cm(2) at an applied field of 0.35 V/mu m. Further the plasma treated MLG exhibits excellent current stability at a lower and higher emission current value. (C) 2015 AIP Publishing LLC.
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页数：4
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