Defect-tolerant extreme ultraviolet nanoscale printing

被引：40

作者：

Urbanski, L. ^{[1
,2
]}

Isoyan, A. ^{[3
]}

Stein, A. ^{[4
]}

Rocca, J. J. ^{[1
,2
]}

Menoni, C. S. ^{[1
,2
]}

Marconi, M. C. ^{[1
,2
]}

机构：

[1] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[3] Synopsys Inc, Hillsboro, OR 97124 USA

[4] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA

来源：

OPTICS LETTERS | 2012年 / 37卷 / 17期

基金：

美国国家科学基金会;

关键词：

X-RAY LASER; REPETITION RATE; LITHOGRAPHY;

D O I：

10.1364/OL.37.003633

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations. (c) 2012 Optical Society of America

引用

页码：3633 / 3635

页数：3

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