Optical materials and coatings at 157 nm

被引：29
|
作者：
Bloomstein, TM [1 ]
Liberman, V [1 ]
Rothschild, M [1 ]
Hardy, DE [1 ]
Goodman, RB [1 ]
机构：
[1] MIT, Lincoln Lab, Lexington, MA 02420 USA
来源：
EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷
关键词：
D O I：
10.1117/12.351106
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection systems. New results include the transmission spectrum of a modified form of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in-situ cleaning to enable a closer examination of purging requirements and cleaning procedures.
引用
收藏
页码：342 / 349
页数：6
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