Optical materials and coatings at 157 nm

被引：29

作者：

Bloomstein, TM ^{[1
]}

Liberman, V ^{[1
]}

Rothschild, M ^{[1
]}

Hardy, DE ^{[1
]}

Goodman, RB ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷

关键词：

D O I：

10.1117/12.351106

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection systems. New results include the transmission spectrum of a modified form of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in-situ cleaning to enable a closer examination of purging requirements and cleaning procedures.

引用

页码：342 / 349

页数：6

共 50 条

[31] LASER-ABLATION OF POLYMERIC MATERIALS AT 157 NM
COSTELA, A
GARCIAMORENO, I
FLORIDO, F
FIGUERA, JM
SASTRE, R
HOOKER, SM
CASHMORE, JS
WEBB, CE
JOURNAL OF APPLIED PHYSICS, 1995, 77 (06) : 2343 - 2350
[32] New materials for 157 nm photoresists: Characterization and properties
Crawford, MK
Feiring, AE
Feldman, J
French, RH
Periyasamy, M
Schadt, FL
Smalley, RJ
Zumsteg, FC
Kunz, RR
Rao, V
Liao, L
Holl, SM
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 : 357 - 364
[33] The challenges in materials design for 157nm photoresists
Patterson, K
Somervell, M
Willson, CG
SOLID STATE TECHNOLOGY, 2000, 43 (03) : 41 - +
[34] The design of resist materials for 157nm lithography
Willson, CG
Trinque, BC
Osborn, BP
Chambers, CR
Hsieh, YT
Chiba, T
Zimmerman, P
Miller, D
Conley, W
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (04) : 583 - 590
[35] Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement
Otani, M
Biro, R
Ouchi, C
Hasegawa, M
Suzuki, Y
Sone, K
Niisaka, S
Saito, T
Saito, J
Tanaka, A
Matsumoto, A
APPLIED OPTICS, 2002, 41 (16) : 3248 - 3255
[36] Long-term laser durability testing of optical coatings and thin films for 157-nm lithography
Liberman, V
Rothschild, M
Palmacci, ST
Efremow, NN
Sedlacek, JHC
Grenville, A
OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 568 - 575
[37] Synthesis of fluorinated materials for 193 nm immersion lithography and 157 nm lithography
Yamashita, T
Ishikawa, T
Yoshida, T
Hayamai, T
Araki, T
Aoyama, H
Hagiwara, T
Itani, Z
Fujii, Z
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2005, 18 (05) : 631 - 639
[38] Machining of optical microstructures with 157 nm laser radiation
Temme, T
Ostendorf, A
Kulik, C
FOURTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2003, 5063 : 233 - 237
[39] 157nm optical lithography: The accomplishments and the challenges
McClay, JA
McIntyre, ASL
SOLID STATE TECHNOLOGY, 1999, 42 (06) : 57 - +
[40] Contamination rates of optical surfaces at 157 nm: Impurities outgassed from construction materials and from photoresists
Bloomstein, TM
Sedlacek, JHC
Palmacci, ST
Hardy, DE
Liberman, V
Rothschild, M
OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 650 - 661

← 1 2 3 4 5 →