Development of high resistant anti-reflection coating by using Al2O3/SiO2 multilayer

被引：4

作者：

Ochi, Yoshihiro ^{[1
]}

Nagashima, Keisuke ^{[1
]}

Okada, Hajime ^{[1
]}

Tanaka, Momoko ^{[1
]}

Tateno, Ryo ^{[2
]}

Furukawa, Yasuyuki ^{[2
]}

Sugiyama, Akira ^{[1
]}

机构：

[1] Japan Atom Energy Agcy, Quantum Beam Sci Directorate, 8-1-7 Umemi Dai, Kyoto 6190215, Japan

[2] Shimadzu Co Ltd, Kyoto 6048511, Japan

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2013 | 2013年 / 8885卷

关键词：

Yb:YAG thin-disk amplifier; anti-reflection coating; Al2O3/SiO2; multilayer; electron beam evaporation; LASER; PICOSECOND;

D O I：

10.1117/12.2030096

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We developed high-resistant anti-reflection (AR) coating by using Al2O3/SiO2 multilayer for Yb:YAG thin disk amplifier. The AR coating was designed both for 940 nm of pump laser at an incident angle of 30 degrees and for 1030 nm of seed laser at 5 degrees. The Al2O3/SiO2 multilayer was deposited by using the electron beam evaporation technique on a fused silica substrate and then the laser induced damage threshold was evaluated. The sample was irradiated by 1030 nm laser with 520 ps duration delivered from the Yb: YAG thin-disk regenerative amplifier. The measured damage threshold of the Al2O3/SiO2 AR coating was 75 J/cm(2).

引用

页数：6

共 50 条

[21] On the applicability of SiO2/Al2O3/Nb2O5 and SiO2/Al2O3/TiO2 as a biocompatible platform for chloroperoxidase
Ribeiro, Marcia Simoes
de Vasconcellos Junior, Fabio Jorge
da Fonseca, Bruna Teixeira
de Souza, Flavia Carvalho
Rojas Soares, Felipo Doval
Lima, Eder Claudio
Cabral, Murilo Feitosa
Ribeiro, Emerson Schwingel
D'Elia, Eliane
ANALYTICAL METHODS, 2014, 6 (02) : 521 - 528
[22] Phase equilibrium data and liquidus for the system “MnO”-CaO-(Al2O3 + SiO2) at Al2O3/SiO2 = 0.41
Ghasem Roghani
Evgueni Jak
Peter Hayes
Metallurgical and Materials Transactions B, 2002, 33 : 839 - 849
[23] Rapid Deposition of Al2O3/SiO2 Composite Coating on Carbon Fiber Fabric
Zhang, Yuping
Shen, Yonghua
Chen, Weiwei
Cheng, Huanwu
Wang, Lu
ADVANCED FUNCTIONAL MATERIALS (CMC 2017), 2018, : 709 - 714
[24] Wetting characteristics of CaO−SiO2−Al2O3 ternary slag on refractory oxides, Al2O3, SiO2 and TiO2
Sung-Mo Seo
Dong-Sik Kim
Young Hyun Paik
Metals and Materials International, 2001, 7 : 479 - 483
[25] Plasma-resistant characteristics according to sintering conditions of CaO–Al2O3–SiO2 glass coating layer
Yoon Sung Jung
Kyung Won Min
Jae Ho Choi
Ji Sob Yoon
Won Bin Im
Hyeong-Jun Kim
Journal of the Korean Ceramic Society, 2022, 59 : 86 - 93
[26] Sol-Gel Deposited Double Layer TiO2 and Al2O3 Anti-Reflection Coating for Silicon Solar Cell
Jung, Jinsu
Jannat, Azmira
Akhtar, M. Shaheer
Yang, O-Bong
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2018, 18 (02) : 1274 - 1278
[27] Improvement in the surface acidity of Al2O3•SiO2 due to a high Al dispersion
Kuroda, Y
Mori, T
Yoshikawa, Y
CHEMICAL COMMUNICATIONS, 2001, (11) : 1006 - 1007
[28] A comparative study on omnidirectional anti-reflection SiO2 nanostructure films coating by glancing angle deposition
Prachachet, R.
Samransuksamer, B.
Horprathum, M.
Eiamchai, P.
Limwichean, S.
Chananonnawathorn, C.
Lertvanithphol, T.
Muthitamongkol, P.
Boonruang, S.
Buranasiri, P.
OXIDE-BASED MATERIALS AND DEVICES IX, 2018, 10533
[29] Improved Photocurrent for Gallium Nitride Photoconductive Semiconductor Switch by SiO2 Anti-Reflection and (SiO2|Ta2O5)6 High-Reflection Dielectric Films
Yang, Xianghong
Hu, Long
Yang, Yingxiang
Huang, Jia
Li, Xin
Liu, Weihua
Han, Chuanyu
IEEE ELECTRON DEVICE LETTERS, 2023, 44 (10) : 1696 - 1699
[30] Effect of al2o3 on properties of plasma sprayed cr2o3/tio2/al2o3/sio2 composite ceramic coating
Jia, Bi
Pan, Fu-Sheng
Chen, Chun-Jiang
Xu, Rong
Jiang, Han-Mei
Wang, Ru-Zhuan
Di, Yong-Jiang
Surface Technology, 2020, 49 (08): : 55 - 62

← 1 2 3 4 5 →