Uniform design and regression analysis of LPCVD boron carbide from BCl3-CH4-H2 system

被引：19

作者：

Liu, Yongsheng ^{[1
]}

Zhang, Litong ^{[1
]}

Cheng, Laifei ^{[1
]}

Zeng, Qingfeng ^{[1
]}

Zhang, Weihua ^{[1
]}

Yang, Wenbin ^{[1
]}

Feng, Zude ^{[2
]}

Li, Siwei ^{[2
]}

Zeng, Bin ^{[2
]}

机构：

[1] Northwestern Polytech Univ, Natl Key Lab Thermostruct Composite Mat, Xian 710072, Shaanxi, Peoples R China

[2] Xiamen Univ, Adv Mat Lab, Dept Mat Sci & Engn, Xiamen 361005, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2009年 / 255卷 / 11期

基金：

美国国家科学基金会;

关键词：

Uniform design; CVD; Microstructure; Boron carbide; Deposition mechanisms; CHEMICAL-VAPOR-DEPOSITION; PYROLYTIC CARBON; MECHANISM; CVD; PYROCARBON; CHEMISTRY; COATINGS; KINETICS; METHANE;

D O I：

10.1016/j.apsusc.2008.12.075

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Boron carbide was prepared by low pressure chemical vapor deposition (LPCVD) from BCl3-CH4-H-2 system. The deposition process conditions were optimized through using a uniform design method and regression analysis. The regression model of the deposition rate was established. The influences of deposition temperature (T), deposition time (t), inlet BCl3/CH4 gas ratio (delta), and inlet H-2/CH4 gas ratio (theta) on deposition rate and microstructure of the coatings were investigated. The optimized deposition parameters were obtained theoretically. The morphologies, phases, microstructure and composition of deposits were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman micro-spectroscopy, transmission electron microscopy (TEM), energy dispersive spectra (EDS), and Auger electron spectra (AES), the results showed that different boron carbides were produced by three kinds of deposition mechanisms. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.

引用

页码：5729 / 5735

页数：7

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