Orientation and diffraction patterns of δ-Ni2Si precipitates in Cu-Ni-Si alloy

被引:54
|
作者
Jia Yan-lin [1 ,2 ]
Wang Ming-pu [1 ,2 ]
Chen Chang [3 ]
Dong Qi-yi [1 ,2 ]
Wang Shan [1 ,2 ]
Li Zhou [1 ,2 ]
机构
[1] Cent S Univ, Sch Mat Sci & Engn, Changsha 410083, Peoples R China
[2] Minist Educ, Key Lab Nonferrous Met Mat Sci & Engn, Changsha 410083, Peoples R China
[3] Cent S Univ, Sch Met Sci & Engn, Changsha 410083, Peoples R China
关键词
Copper alloys; delta-Ni2Si precipitates; High-resolution electron microscopy (HREM); Electron diffraction; HIGH-CONDUCTIVITY; MICROSTRUCTURE; STRENGTH; BEHAVIOR;
D O I
10.1016/j.jallcom.2012.12.154
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Morphology, orientation and diffraction patterns of delta-Ni2Si precipitates in a Cu-Ni-Si alloy are investigated by TEM and HREM. Many disk-shaped nanosized delta-Ni2Si precipitates are uniformly distributed in Cu-1.5 wt% Ni-0.34 wt% Si alloy in an over-aging condition. The delta-Ni2Si precipitates preserve an orthogonal structure with a = 0.708 +/- 0.005 nm, b = 0.504 +/- 0.005 nm, and c = 0.364 +/- 0.005 nm. The orientation relationships of six variants of delta-Ni2Si precipitates with Cu-matrix can be determined as (100)p parallel to{001}Cu, [100]p parallel to < 110 > Cu and [010]p parallel to < 110 > Cu. Two typical diffraction pattern models under [001](Cu) and [111](Cu) zone axis are simulated according to diffraction effects of multiple variants, secondary diffraction and the size of particles, which coincide with the experimental results perfectly. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:147 / 151
页数:5
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