Sub μm Nb/AlOx/Nb Josephson junctions fabricated by anodization techniques

被引：5
|
作者：
Dolata, R [1 ]
Weimann, T [1 ]
Scherer, HJ [1 ]
Niemeyer, J [1 ]
机构：
[1] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany
来源：
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1999年 / 9卷 / 02期
关键词：
D O I：
10.1109/77.783723
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Technological processes for the fabrication of Nb/AlOx/Nb Josephson junctions with areas as small as 0.04 mu m(2), based on anodization techniques, are investigated. A cross strip process requiring only two masks is compared with a standard three mask etching and anodization process. Details of the fabrication processes as well as the electrical characterization at 4.2 K and 30 mK of tunnel junctions fabricated by the different methods are presented. Limitations and applications of the two different processes are discussed.
引用
收藏
页码：3255 / 3258
页数：4
相关论文
共 50 条
  • [1] Sub μm Nb/AlOx/Nb Josephson junctions fabricated by anodization techniques
    Dolata, Ralf
    Weimann, Thomas
    Scherer, Hans-Joerg
    Niemeyer, Juergen
    [J]. IEEE Transactions on Applied Superconductivity, 1999, 9 (2 III): : 3255 - 3258
  • [2] CHARACTERIZATION OF NB/ALOX-AL/NB JOSEPHSON-JUNCTIONS BY ANODIZATION PROFILES
    IMAMURA, T
    HASUO, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 66 (05) : 2173 - 2180
  • [3] Sub-gap leakage in Nb/AlOx/Nb and Al/AlOx/Al Josephson junctions
    Gubrud, MA
    Ejrnaes, M
    Berkley, AJ
    Ramos, RC
    Jin, I
    Anderson, JR
    Dragt, AJ
    Lobb, CJ
    Wellstood, FC
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2001, 11 (01) : 1002 - 1005
  • [4] REPRODUCIBLE NB/ALOX/NB JOSEPHSON-JUNCTIONS
    OHARA, S
    IMAMURA, T
    HASUO, S
    [J]. FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1988, 24 (01): : 47 - 53
  • [5] REPRODUCIBLE Nb/AlOx/Nb JOSEPHSON JUNCTIONS.
    Ohara, Shiro
    Imamura, Takeshi
    Hasuo, Shinya
    [J]. Fujitsu Scientific and Technical Journal, 1988, 24 (01): : 47 - 53
  • [6] Anodization-based area reduction process of Nb/Al-AlOx/Nb Josephson junctions
    Andreone, D
    Lacquaniti, V
    Maggi, S
    Monticone, E
    Steni, R
    [J]. APPLIED SUPERCONDUCTIVITY 1997, VOLS 1 AND 2: VOL 1: SMALL SCALE AND ELECTRONIC APPLICATIONS; VOL 2: LARGE SCALE AND POWER APPLICATIONS, 1997, (158): : 535 - 538
  • [7] Self-shunted Nb/AlOx/Nb Josephson junctions
    Patel, V
    Lukens, JE
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1999, 9 (02) : 3247 - 3250
  • [8] EVALUATION OF ALOX BARRIER THICKNESS IN NB JOSEPHSON-JUNCTIONS USING ANODIZATION PROFILES
    IMAMURA, T
    HASUO, S
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (24) : 2550 - 2552
  • [9] Nb/Al/AlOx/AlOx/Al/Nb Josephson junctions for programmable voltage standards
    Schulze, H
    Behr, R
    Muller, F
    Niemeyer, J
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (07) : 996 - 998
  • [10] Thermal annealing of Nb/Al-AlOx/Nb Josephson junctions
    Migacz, JV
    Huber, ME
    [J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2003, 13 (02) : 123 - 126
12345