GaN-HEMTs for High-Voltage Switching Applications

被引:2
|
作者
Saito, Wataru [1 ]
机构
[1] Toshiba Co Ltd, Semicond Co, Sawai Ku, Kawasaki, Kanagawa 2128583, Japan
关键词
YELLOW LUMINESCENCE; ALGAN/GAN HFETS; FIELD-PLATES; OPERATION; GATE;
D O I
10.1149/1.3631485
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
GaN HEMTs can realize high-power-density operation with low power loss in power electronic systems due to ultra low specific on-resistance below the Si-limit. The dynamic on-resistance, however, is degraded by the current collapse phenomena. The relation between the dynamic on-resistance and the maximum electric field peak showed universality, which was independent from the field plate (FP) structure and the wafer. The gate-edge electric field strongly affects the increase of the dynamic on-resistance. Yellow luminescence intensity strongly related with current collapse phenomena and can be utilized as a useful index for improving the wafer quality. High speed switching was obtained at the turn-off switching test with an inductive load. The switching speed of the GaN-HEMT can be controlled by the external gate resistance as same manner as the conventional Si-MOSFET. For the compatibility with the same loss and dV/dt, the gate resistance must be set to 10 times higher than that at the Si-MOSFET due to low Q(gd).
引用
收藏
页码:43 / 49
页数:7
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