Lithography applications of the new Tencor Surfscan AIT laser-based defect inspection system

被引：0
|
作者：
Lincoln, I [1 ]
Howland, RS [1 ]
Wells, K [1 ]
机构：
[1] TENCOR INSTRUMENTS,WAFER INSPECT DIV,MT VIEW,CA 94043
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X | 1996年 / 2725卷
关键词：
D O I：
10.1117/12.240123
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：742 / 745
页数：4
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