共 50 条
- [22] HfO2 dielectric film growth directly on graphene by H2O-based atomic layer deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (01):
- [23] Boron Emitter Passivation With Al2O3 and Al2O3/SiNx Stacks Using ALD Al2O3 IEEE JOURNAL OF PHOTOVOLTAICS, 2013, 3 (01): : 236 - 245
- [24] Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Cailiao Yanjiu Xuebao/Chinese Journal of Materials Research, 2022, 36 (01): : 8 - 12
- [26] High Throughput ALD of Al2O3 layers for Surface Passivation of Silicon Solar Cells ATOMIC LAYER DEPOSITION APPLICATIONS 6, 2010, 33 (02): : 441 - 446
- [27] LOW-TEMPERATURE GROWTH OF THIN-FILMS OF AL2O3 BY SEQUENTIAL SURFACE CHEMICAL-REACTION OF TRIMETHYLALUMINUM AND H2O2 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (6B): : L1139 - L1141
- [29] Pre-Patterned CVD Graphene: Insights on ALD deposition parameters and their influence on Al2O3 and graphene layers MRS ADVANCES, 2016, 1 (20): : 1401 - 1409