Promotion Effect of α-Al2O3 Seeds on Low-temperature Deposition of α-Al2O3 Films by Reactive Sputtering

被引：0

作者：

Li X. ^{[1
]}

Qiu W. ^{[1
]}

Jiao D. ^{[1
]}

Zhong X. ^{[1
]}

Liu Z. ^{[1
]}

机构：

[1] School of Materials Science and Engineering, South China University of Technology, Guangzhou

来源：

Cailiao Yanjiu Xuebao/Chinese Journal of Materials Research | 2022年 / 36卷 / 01期

基金：

中国国家自然科学基金;

关键词：

Low-temperature deposition; Reactive sputtering; Surface and interface in the materials; α; seeds; α-Al[!sub]2[!/sub]O[!sub]3[!/sub] films;

D O I：

10.11901/1005.3093.2021.254

中图分类号：

学科分类号：

摘要：

The films of corundum structure Al2O3 were successfully deposited on gold foil with pre-deposited α-Al2O3 seeds at low-temperature by reactive RF (Radio Frequency) sputtering with Al+α-Al2O3(15% α-Al2O3) target. The surface morphology, phase constituent and chemical composition of the as-deposited films were characterized by SEM, GIXRD and EDS. Results show that films of single α-Al2O3 with corundum-like crystallographic structure could be deposited at 560℃ on Si(100) substrate by reactive sputtering with Al+α-Al2O3 as composite target, while the substrate temperature even could be reduced to 500℃ for gold foil with pre-deposited α-Al2O3 seeds (the density of α-Al2O3 seeds is ~106/cm2) by reactive sputtering with pure Al as target. The results of the above two deposition methods proved that α-Al2O3 seeds may be favorable for the deposition of single phase α-Al2O3 films on the substrate at lower temperature. © 2022, Editorial Office of Chinese Journal of Materials Research. All right reserved.

引用

页码：8 / 12

页数：4

共 19 条

[1] Bouzakis K D, Michailidis N, Skordaris G, Et al., Cutting with coated tools: coating technologies, characterization methods and performance optimization, CIRP Ann, 61, 2, (2012)
[2] Bobzin K, Bagcivan N, Ewering M., Crystalline γ-alumina deposited in an industrial coating unit for demanding turning operations, Adv. Eng. Mater, 12, 1-2, (2010)
[3] Bobzin K, Hirt G, Bagcivan N, Et al., Crystalline γ-Al2O3 physical vapour deposition-coating for steel thixoforging tools, J. Nanosci. Nanotechnol, 11, 10, (2011)
[4] Edlmayr V, Moser M, Walter C, Et al., Thermal stability of sputtered Al2O3 coatings, Surf. Coat. Technol, 204, 9-10, (2010)
[5] Eklund P, Sridharan M, Singh G, Et al., Thermal stability and phase transformations of γ-/amorphous-Al2O3 thin films, Plasma Process Polym, 6, (2009)
[6] Musil J, Blazek J, Zeman P, Et al., Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering, Appl. Surf. Sci, 257, 3, (2010)
[7] Deposition Ruppi S., microstructure and properties of texture-controlled CVD α-Al2O3 coatings, Int. J. Refract. Hard Met, 23, 4-6, (2005)
[8] Zywitzki O, Hoetzsch G, Fietzke F, Et al., Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering, Surf. Coat. Technol, 82, 1-2, (1996)
[9] Zywitzki O, Hoetzsch G., Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering, Surf. Coat. Technol, 86, (1996)
[10] Brill R, Koch F, Mazurelle J, Et al., Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage [J], Surf. Coat. Technol, 174, (2003)

← 1 2 →