In Vacuo Photoemission Studies of Platinum Atomic Layer Deposition Using Synchrotron Radiation

被引:32
|
作者
Geyer, Scott M. [1 ]
Methaapanon, Rungthiwa [1 ]
Shong, Bonggeun [1 ]
Pianetta, Piero A. [2 ]
Bent, Stacey F. [1 ]
机构
[1] Stanford Univ, Dept Chem Engn, Stanford, CA 94035 USA
[2] Stanford Synchrotron Radiat Lightsource, SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA
来源
关键词
THIN-FILMS; ADSORPTION; OXIDE; CYCLOPENTENE; RUTHENIUM; PT(111);
D O I
10.1021/jz301475z
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The mechanism of platinum atomic layer deposition using (methylcyclopentadienyl)trimethylplatinum and oxygen is investigated with in vacuo photoemission spectroscopy at the Stanford Synchrotron Radiation Lightsource. With this surface-sensitive technique, the surface species following the Pt precursor half cycle and the oxygen counter-reactant half cycle can be directly measured. We observed significant amounts of carbonaceous species following the Pt precursor pulse, consistent with dehydrogenation of the precursor ligands. Significantly more carbon is observed when deposition is carried out in the thermal decomposition temperature region. The carbonaceous layer is removed during the oxygen counter reactant pulse, and the photoemission spectrum shows that a layer of adsorbed oxygen remains on the surface as previously predicted.
引用
收藏
页码:176 / 179
页数:4
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