The resistance based extraction method for the determination of effective channel length and series resistance behaviour with gate bias is critically analysed. The impossibility of extracting the gate voltage variations of these parameters concurrently is demonstrated. Then a new parameter extraction procedure is given and experimentally applied to a wide range of technologies, from 1.2 mu m down to 0.1 mu m. Finally, the lack of resolution in the determination of channel length. reduction and series resistance when the effective gate bias tends to zero and the impact of the substrate gate bias on these parameters is studied in detail.
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAStanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
Bennett, Robert K. A.
Hoang, Lauren
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAStanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
Hoang, Lauren
Cremers, Connor
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAStanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
Cremers, Connor
Mannix, Andrew J.
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Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAStanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
Mannix, Andrew J.
Pop, Eric
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USAStanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
机构:
Sierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USASierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USA
Hu, Genda J.
Chang, Chi
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Sierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USASierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USA
Chang, Chi
Chia, Yu-Tai
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Sierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USASierra Semiconductor Corp, San Jose,, CA, USA, Sierra Semiconductor Corp, San Jose, CA, USA
机构:
Slovak Univ Technol Bratislava, Inst Elect & Photon, Bratislava 81219, SlovakiaSlovak Univ Technol Bratislava, Inst Elect & Photon, Bratislava 81219, Slovakia
Weis, Martin
Lee, Keanchuan
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Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanSlovak Univ Technol Bratislava, Inst Elect & Photon, Bratislava 81219, Slovakia
Lee, Keanchuan
Taguchi, Dai
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Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanSlovak Univ Technol Bratislava, Inst Elect & Photon, Bratislava 81219, Slovakia
Taguchi, Dai
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Manaka, Takaaki
Iwamoto, Mitsumasa
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Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanSlovak Univ Technol Bratislava, Inst Elect & Photon, Bratislava 81219, Slovakia