Temperature dependence of Q in spiral inductors fabricated in a silicon-germanium/BiCMOS technology

被引:16
|
作者
Groves, R [1 ]
Stein, K [1 ]
Harame, D [1 ]
Jadus, D [1 ]
机构
[1] IBM CORP,MICROELECT DIV,HOPEWELL JCT,NY 12533
关键词
D O I
10.1109/BIPOL.1996.554635
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:153 / 156
页数:4
相关论文
共 50 条
  • [41] EFFECTS OF TEMPERATURE ON STRUCTURAL-PROPERTIES OF HYDROGENATED AMORPHOUS SILICON-GERMANIUM AND CARBON-SILICON-GERMANIUM ALLOYS
    BATTEZZATI, L
    DEMICHELIS, F
    PIRRI, CF
    TRESSO, E
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (04) : 2029 - 2032
  • [42] Low-temperature diffusion of lithium in silicon-germanium solid solutions
    I. G. Atabaev
    N. A. Matchanov
    É. N. Bakhranov
    Physics of the Solid State, 2001, 43 : 2234 - 2236
  • [43] SILICON-GERMANIUM ALLOYS AS HIGH-TEMPERATURE THERMOELECTRIC-MATERIALS
    BHANDARI, CM
    ROWE, DM
    CONTEMPORARY PHYSICS, 1980, 21 (03) : 219 - 242
  • [44] Low-temperature diffusion of lithium in silicon-germanium solid solutions
    Atabaev, IG
    Matchanov, NA
    Bakhranov, ÉN
    PHYSICS OF THE SOLID STATE, 2001, 43 (12) : 2234 - 2236
  • [45] A low-temperature ion vapor deposition technique for silicon and silicon-germanium epitaxy
    Mohajerzadeh, S
    Selvakumar, CR
    Brodie, DE
    Robertson, MD
    Corbett, JM
    CANADIAN JOURNAL OF PHYSICS, 1996, 74 : S69 - S73
  • [46] Characterization of high-Q spiral inductors on thick insulator-on-silicon
    Rais-Zadeh, M
    Ayazi, F
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2005, 15 (11) : 2105 - 2112
  • [47] Low-temperature preparation of oxygen- and carbon-free silicon and silicon-germanium surfaces for silicon and silicon-germanium epitaxial growth by rapid thermal chemical vapor deposition
    Carroll, MS
    Sturm, JC
    Yang, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (12) : 4652 - 4659
  • [48] Design and fabrication of high-Q spiral inductors using MEMS technology
    Electronics Research Institute, Cairo, Egypt
    WSEAS Trans. Electron., 2006, 8 (432-436):
  • [49] A 60-GHz superheterodyne downconversion mixer in silicon-germanium bipolar technology
    Reynolds, SK
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2004, 39 (11) : 2065 - 2068
  • [50] Stress in Silicon-Germanium Nanowires: Layout Dependence and Imperfect Source/Drain Epitaxial Stressors
    Eneman, Geert
    Veloso, Anabela
    Favia, Paola
    Hikavyy, Andriy
    Porret, Clement
    Arimura, Hiroaki
    De Keersgieter, An
    Pourtois, Geoffrey
    Loo, Roger
    Spessot, Alessio
    Matagne, Philippe
    Ryckaert, Julien
    Horiguchi, Naoto
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (11) : 5380 - 5385