Direct measurement of the linewidth of relief element on AFM in nanometer range

被引：0

作者：

Novikov, Yu. A. ^{[1
]}

Filippov, M. N. ^{[2
]}

Lysov, I. D. ^{[3
]}

Rakov, A. V. ^{[1
]}

Sharonov, V. A. ^{[3
]}

Todua, P. A. ^{[4
]}

机构：

[1] Russian Acad Sci, AM Prokhorov Gen Phys Inst, 38 Vavilov Str, Moscow 119991, Russia

[2] Russian Acad Sci, NS Kurnakov Gen & Inorgan Chem Inst, Moscow 119991, Russia

[3] Moscow Inst Phys & Technol, Moscow 141700, Russia

[4] Ctr Surface & Vacuum Res, Moscow 119421, Russia

来源：

MICRO- AND NANOELECTRONICS 2007 | 2008年 / 7025卷

关键词：

atomic force microscope; calibration; test object; linewidth;

D O I：

10.1117/12.802427

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The article includes the results of the study of image formation in atomic force microscope (AFM). The influence of radius and angle characteristics of cantilever tip as well as the relief of the surface studied on the signal waveform is shown. The authors demonstrate the techniques of AFM calibration and direct measurement of linear sizes of trapezoid structures including the line width with the use of AFM signal and its first derivative. There were obtained the equations establishing relations the sizes of trapezoid structures with the sizes of test segments chosen on AFM signals.

引用

页数：10

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