ANYL 183-Surface modification strategy for controlling the self-assembly of PS-b-PMMA in thin films

被引：0
|
作者：
Han, Eungnak
Nealey, Paul F. [1 ]
Gopalan, Padma [2 ]
机构：
[1] Univ Wisconsin, Dept Biol & Chem Engn, Madison, WI 53706 USA
[2] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2008年 / 235卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
183-ANYL
引用
收藏
页数：1
相关论文
共 50 条
  • [31] Effect of Grafting Density of Random Copolymer Brushes on Perpendicular Alignment in PS-b-PMMA Thin Films
    Lee, Wooseop
    Park, Sungmin
    Kim, Yeongsik
    Sethuraman, Vaidyanathan
    Rebello, Nathan
    Ganesan, Venkat
    Ryu, Du Yeol
    MACROMOLECULES, 2017, 50 (15) : 5858 - 5866
  • [32] Non-equilibrium self-assembled structures in thick PS-b-PMMA copolymer films
    Holoubek, J.
    Lednický, F.
    Baldrian, J.
    European Polymer Journal, 2006, 42 (10): : 2236 - 2246
  • [33] The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films
    Andreozzi, A.
    Poliani, E.
    Seguini, G.
    Perego, M.
    NANOTECHNOLOGY, 2011, 22 (18)
  • [34] Surface structure of thin asymmetric PS-b-PMMA diblock copolymers investigated by atomic force microscopy
    Khaydarov, A. A.
    Hamley, I. W.
    Legge, Thomas M.
    Perrier, Sebastien
    EUROPEAN POLYMER JOURNAL, 2007, 43 (03) : 789 - 796
  • [35] Surface structure of thin asymmetric PS-b-PMMA diblock copolymers investigated by atomic force microscopy
    Khaydarov, A.A.
    Hamley, I.W.
    Legge, Thomas M.
    Perrier, Sébastien
    European Polymer Journal, 2007, 43 (03): : 789 - 796
  • [36] Phosphorene-directed self-assembly of asymmetric PS-b-PMMA block copolymer for perpendicularly-oriented sub-10nm PS nanopore arrays
    Zhang, Ziming
    Zheng, Lu
    Khurram, Muhammad
    Yan, Qingfeng
    NANOTECHNOLOGY, 2017, 28 (42)
  • [37] Self-assembly of high-resolutions PS-b-PMMA block-copolymers: processes capabilities and integration on 300mm track
    Chevalier, X.
    Nicolet, C.
    Tiron, R.
    Gharbi, A.
    Chamiot-Maitral, G.
    Jullian, K.
    Pimenta-Barros, P.
    Argoud, M.
    Peyre, J-L.
    Van Spaandonk, R.
    Fleury, G.
    Hadziioannou, G.
    Navarro, C.
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VI, 2014, 9049
  • [38] Self-assembly of PS-b-PNIPAM-b-PS block copolymer thin films via selective solvent annealing
    Mocan, Merve
    Kamperman, Marleen
    POLYMER, 2016, 107 : 387 - 397
  • [39] Ordering dynamics in symmetric PS-b-PMMA diblock copolymer thin films during rapid thermal processing
    Perego, Michele
    Ferrarese Lupi, Federico
    Ceresoli, Monica
    Giammaria, Tommaso Jacopo
    Seguini, Gabriele
    Enrico, Emanuele
    Boarino, Luca
    Antonioli, Diego
    Gianotti, Valentina
    Sparnacci, Katia
    Laus, Michele
    JOURNAL OF MATERIALS CHEMISTRY C, 2014, 2 (32) : 6655 - 6664
  • [40] Fabrication of highly ordered microporous thin films by PS-b-PAA self-assembly and investigation of their tunable surface properties
    Wang, Chengyin
    Mao, Yindao
    Wang, Deyan
    Qu, Qishu
    Yang, Gongjun
    Hu, Xiaoya
    JOURNAL OF MATERIALS CHEMISTRY, 2008, 18 (06) : 683 - 690
12345