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- [5] Diamond disc pad conditioning in chemical mechanical planarization (CMP): A surface element method to predict pad surface shape PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2012, 36 (02): : 356 - 363
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- [10] Development of a pad conditioning simulation module with a diamond dresser for CMP applications INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2010, 50 (1-4): : 1 - 12