Effect of Schottky annealing temperature on reverse leakage current of 6500 V 4H-SiC JBS diodes

被引:3
|
作者
Niu, Xiping [1 ]
Wei, Xiaoguang [1 ]
An, Yunlai [1 ]
Sang, Ling [1 ]
Wu, Peifei [1 ]
Zhou, Yang [1 ]
Sun, Botao [2 ]
Zhang, Wenting [1 ]
Liu, Rui [1 ]
Du, Zechen [1 ]
Li, Chenmeng [1 ]
Shen, Zhanwei [3 ]
Yang, Tongtong [1 ]
Luo, Weixia [1 ]
Tian, Yan [1 ]
Yang, Fei [1 ]
机构
[1] Beijing Inst Smart Energy, State Key Lab Adv Power Transmiss Technol, Beijing 102209, Peoples R China
[2] Beijing Century Goldray Semicond Co Ltd, Beijing 100176, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
关键词
A1; 4H-SiC; A2; JBS; A3; Diodes; B1; Temperature; B2; Schottky Barrier; B3; Reverse Leakage Current;
D O I
10.1016/j.jcrysgro.2023.127103
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Annealing treatment has an important effect on the electrical properties of Schottky diodes. In this paper, the effect of Schottky annealing temperature on reverse leakage current of 6500 V 4H-SiC JBS diodes was studied. The reverse leakage current of the diode annealed at 500 degrees C is higher than that of the diode annealed at 450 degrees C. This is because the Schottky barrier height of the diode annealed at 500 degrees C is decreased by 0.08 eV, which leads to a large reverse leakage current. Meanwhile, the Schottky barrier height of the diode annealed at 500 degrees C is decreased more significantly with the increase of measurement temperature, therefore the reverse leakage current increases significantly.
引用
收藏
页数:4
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