Lorentz near-field electron ptychography

被引:3
|
作者
You, Shengbo [1 ]
Lu, Peng-Han [2 ,3 ]
Schachinger, Thomas [4 ,5 ]
Kovacs, Andras [2 ,3 ]
Dunin-Borkowski, Rafal E. [2 ,3 ]
Maiden, Andrew M. [1 ,6 ]
机构
[1] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 4DE, England
[2] Forschungszentrum Juelich, Ernst Ruska Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany
[3] Forschungszentrum Juelich, Peter Grunberg Inst, D-52425 Julich, Germany
[4] TU Wien, Inst Solid State Phys, A-1040 Vienna, Austria
[5] TU Wien, Univ Serv Ctr Transmiss Electron Microscopy, A-1040 Vienna, Austria
[6] Diamond Light Source, Diamond House,Harwell Sci & Innovat Campus, Didcot OX11 0DE, England
基金
欧盟地平线“2020”;
关键词
All Open Access; Hybrid Gold;
D O I
10.1063/5.0169788
中图分类号
O59 [应用物理学];
学科分类号
摘要
Over the past few years, electron ptychography has drawn considerable attention for its ability to recover high contrast and ultra-high resolution images without the need for high quality electron optics. In this Letter, we focus on electron ptychography's other potential benefits: quantitatively mapping phase variations resulting from magnetic and electric fields over extended fields of view. To this end, we propose an implementation of near-field ptychography that employs an amplitude mask located in the electron microscope's condenser aperture plane. We demonstrate the capabilities of our method by imaging a magnetic Permalloy sample and compare our results with those of off-axis electron holography.
引用
收藏
页数:5
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