Proton irradiation-induced dynamic characteristics on high performance GaN/AlGaN/GaN Schottky barrier diodes

被引:0
|
作者
Zhang, Tao [1 ]
Li, Ruo-Han [2 ]
Su, Kai [1 ]
Su, Hua-Ke [1 ]
Lv, Yue-Guang [3 ]
Xu, Sheng-Rui [1 ]
Zhang, Jin-Cheng [1 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond & Devices, Xian 710071, Peoples R China
[2] Xian Microelect Technol Inst, Xian 710054, Peoples R China
[3] Xidian Univ, Sch Aerosp Sci & Technol, Xian 710071, Peoples R China
基金
中国国家自然科学基金;
关键词
AlGaN; GaN SBDs; GaN passivation layer; proton irradiation; dynamic on-resistance; CURRENT-COLLAPSE; P-GAN; N-GAN; TRANSISTORS; DAMAGE;
D O I
10.1088/1674-1056/acbded
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Dynamic characteristics of the single-crystal GaN-passivated lateral AlGaN/GaN Schottky barrier diodes (SBDs) treated with proton irradiation are investigated. Radiation-induced changes including idealized Schottky interface and slightly degraded on-resistance (R (ON)) are observed under 10-MeV proton irradiation at a fluence of 10(14) cm(-2). Because of the existing negative polarization charges induced at GaN/AlGaN interface, the dynamic ON-resistance (R (ON,dyn)) shows negligible degradation after a 1000-s-long forward current stress of 50 mA to devices with and without being irradiated by protons. Furthermore, the normalized R (ON,dyn) increases by only 14% that of the initial case after a 100-s-long bias of -600 V has been applied to the irradiated devices. The high-performance lateral AlGaN/GaN SBDs with tungsten as anode metal and in-situ single-crystal GaN as passivation layer show a great potential application in the harsh radiation environment of space.
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页数:5
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