Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching

被引：0

作者：

Gao, Lang ^{[1
,2
,3
]}

Liang, Youting ^{[4
]}

Song, Lvbin ^{[4
]}

Yin, Difeng ^{[1
,2
,3
]}

Qi, Jia ^{[4
]}

Chen, Jinming ^{[4
]}

Liu, Zhaoxiang ^{[4
]}

Yu, Jianping ^{[4
]}

Liu, Jian ^{[4
]}

Zhang, Haisu ^{[4
,5
]}

Fang, Zhiwei ^{[4
]}

Qi, Hongxin ^{[5
]}

Cheng, Ya ^{[1
,2
,4
,5
,6
,7
,8
,9
]}

机构：

[1] Chinese Acad Sci, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech SIOM, CAS Ctr Excellence Ultraintense Laser Sci, Shanghai 201800, Peoples R China

[3] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

[4] East China Normal Univ, Sch Phys & Elect Sci, Extreme Optoelectromech Lab XXL, Shanghai 200241, Peoples R China

[5] East China Normal Univ, State Key Lab Precis Spect, Shanghai 200062, Peoples R China

[6] Shanxi Univ, Collaborat Innovat Ctr Extreme Opt, Taiyuan 030006, Shanxi, Peoples R China

[7] Shandong Normal Univ, Collaborat Innovat Ctr Light Manipulat & Applicat, Jinan 250358, Peoples R China

[8] Hefei Natl Lab, Hefei 230088, Peoples R China

[9] Photon Integrated Chip East China Normal Univ, Joint Res Ctr Light Manipulat Sci & Photon Integra, Shanghai 200241, Peoples R China

来源：

OPTICS LETTERS | 2024年 / 49卷 / 03期

基金：

中国国家自然科学基金;

关键词：

CIRCULATORS;

D O I：

10.1364/OL.512220

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report an electro-optic isolator fabricated on thin-film lithium niobate by photolithography -assisted chemo-mechanical etching that shows an isolation of 39.50 dB and an overall fiber-to-fiber loss of 2.6 dB. (c) 2024 Optica Publishing Group

引用

页码：614 / 617

页数：4

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