共 50 条
- [2] Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography [J]. JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2022, 21 (04):
- [4] Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks [J]. EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI, 2015, 9422
- [5] Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography [J]. JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, 22 (02):
- [6] Image formation in extreme ultraviolet lithography and numerical aperture effects [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2992 - 2997
- [8] Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces [J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2019, 48 (08):
- [9] High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2017, 16 (04):