Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

被引：0
|
作者：
Mao, Shanshan [1 ]
Li, Yanqiu [1 ]
Liu, Ke [1 ]
Liu, Lihui [1 ]
Zheng, Meng [1 ]
Yan, Xu [1 ]
机构：
[1] Key Laboratory of Photoelectronic Imaging Technology and System, School of Optics and Photonics, Beijing Institute of Technology, Beijing,100081, China
来源：
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering | 2019年 / 48卷 / 08期
关键词：
Wavefronts - Optical design - Aberrations - Optical instrument lenses;
D O I：
10.3788/IRLA201948.0814002
中图分类号：
学科分类号：
摘要：
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