Effect of Electrode Material on the Polarization Switching Kinetics of Hf0.5Zr0.5O2 Film

被引:1
|
作者
Lee, Dong Hyun [1 ]
Park, Geun Hyeong [1 ]
Kim, Se Hyun [1 ]
Yang, Kun [1 ]
Lee, Jaewook [1 ]
Choi, Hyojun [1 ]
Lee, Younghwan [2 ]
Ryu, Jin Ju [3 ,4 ]
Lee, Je In [5 ]
Kim, Gun Hwan [3 ,6 ]
Park, Min Hyuk [1 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
[2] Seoul Natl Univ, Res Inst Adv Mat, Seoul 08826, South Korea
[3] Korea Res Inst Chem Technol KRICT, Div Adv Mat, Daejeon 34114, South Korea
[4] Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
[5] Pusan Natl Univ, Sch Mat Sci & Engn, Busan 46241, South Korea
[6] Yonsei Univ, Sch Syst & Semicond Engn, Seoul 03722, South Korea
基金
新加坡国家研究基金会;
关键词
Switches; Electrodes; Kinetic theory; Tin; Capacitors; Pulse measurements; Grain size; Ferroelectrics; Hafnium zirconium oxide; ferroelectric memory; domain dynamics;
D O I
10.1109/LED.2023.3294522
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrode materials can significantly impact the chemical and physical properties and polarization switching kinetics of ferroelectric Hf0.5Zr0.5O2 (HZO) films deposited through atomic layer deposition. In this study, the effect of various electrode materials (TiN, Mo, and W) on the microstructure and polarization switching properties of HZO films is investigated. The nucleation-limited switching model indicates that the Mo electrode is beneficial in the case of small device-to-device variation, whereas W and TiN electrodes are advantageous for accomplishing high-speed operations.
引用
下载
收藏
页码:1440 / 1443
页数:4
相关论文
共 50 条
  • [1] Mechanical Polarization Switching in Hf0.5Zr0.5O2 Thin Film
    Guan, Zhao
    Li, Yun-Kangqi
    Zhao, Yi-Feng
    Peng, Yue
    Han, Genquan
    Zhong, Ni
    Xiang, Ping-Hua
    Chu, Jun-Hao
    Duan, Chun-Gang
    NANO LETTERS, 2022, 22 (12) : 4792 - 4799
  • [2] Characterizing polarization switching kinetics of ferroelectric Hf0.5Zr0.5O2 at cryogenic temperature
    Xu, Jiacheng
    Shen, Rongzong
    Qian, Haoji
    Lin, Gaobo
    Gu, Jiani
    Rong, Jian
    Liu, Huan
    Ding, Yian
    Zhang, Miaomiao
    Liu, Yan
    Jin, Chengji
    Chen, Jiajia
    Han, Genquan
    JOURNAL OF APPLIED PHYSICS, 2024, 136 (10)
  • [3] Temperature dependent polarization -switching behavior in Hf0.5Zr0.5O2 ferroelectric film
    Chen, Haiyan
    Tang, Lin
    Liu, Leyang
    Chen, Yonghong
    Luo, Hang
    Yuan, Xi
    Zhang, Dou
    MATERIALIA, 2020, 14
  • [4] Observing ferroelastic switching in Hf0.5Zr0.5O2 thin film
    Guan, Zhao
    Wang, Tao
    Zheng, Yunzhe
    Peng, Yue
    Wei, Luqi
    Zhang, Yuke
    Mattursun, Abliz
    Huang, Jiahao
    Tong, Wen-Yi
    Han, Genquan
    Chen, Binbin
    Xiang, Ping-Hua
    Duan, Chun-Gang
    Zhong, Ni
    CHINESE PHYSICS B, 2024, 33 (06)
  • [5] Structural changes during wake-up and polarization switching in a ferroelectric Hf0.5Zr0.5O2 film
    Margolin, Ilya
    Korostylev, Evgeny
    Kalika, Elizaveta
    Negrov, Dmitrii
    Chouprik, Anastasia
    Acta Materialia, 2025, 284
  • [6] The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2:La films
    Perevalov, Timofey, V
    Prosvirin, Igor P.
    Suprun, Evgenii A.
    Mehmood, Furqan
    Mikolajick, Thomas
    Schroeder, Uwe
    Gritsenko, Vladimir A.
    JOURNAL OF SCIENCE-ADVANCED MATERIALS AND DEVICES, 2021, 6 (04): : 595 - 600
  • [7] Polarization and Resistive Switching in Epitaxial 2 nm Hf0.5Zr0.5O2 Tunnel Junctions
    Sulzbach, Milena Cervo
    Tan, Huan
    Estandia, Saul
    Gazquez, Jaume
    Sanchez, Florencio
    Fina, Ignasi
    Fontcuberta, Josep
    ACS APPLIED ELECTRONIC MATERIALS, 2021, 3 (08) : 3657 - 3666
  • [8] Effect of Domain Structure and Dielectric Interlayer on Switching Speed of Ferroelectric Hf0.5Zr0.5O2 Film
    Chouprik, Anastasia
    Savelyeva, Ekaterina
    Korostylev, Evgeny
    Kondratyuk, Ekaterina
    Zarubin, Sergey
    Sizykh, Nikita
    Zhuk, Maksim
    Zenkevich, Andrei
    Markeev, Andrey M.
    Kondratev, Oleg
    Yakunin, Sergey
    NANOMATERIALS, 2023, 13 (23)
  • [9] Nanoscale Investigation of the Effect of Annealing Temperature on the Polarization Switching Dynamics of Hf0.5Zr0.5O2 Thin Films
    An, Sang Won
    Bae, Seong Bin
    Kim, Beomjun
    Kim, Yoon Ki
    Kim, Jaeseung
    Jung, Tae Hyun
    Lee, Jae Heon
    Lee, Sang Woo
    Park, Yu Bin
    Kim, Hyunjung
    Yoo, Hyobin
    Yang, Sang Mo
    ADVANCED MATERIALS INTERFACES, 2024, 11 (21):
  • [10] Ferroelectric switching behavior of nanoscale Hf0.5Zr0.5O2 grains
    Chen, Qiang
    Zhang, Yuke
    Liu, Wenyan
    Jiang, Jie
    Yang, Qiong
    Jiang, Limei
    INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES, 2021, 212