Toward streaked collective Thomson scattering measurements on an extreme ultraviolet plasma light source

被引：2
|
作者：
Simeni, M. Simeni [1 ,2 ]
Davies, A. S. [3 ,4 ]
Diallo, A. [1 ]
机构：
[1] Princeton Plasma Phys Lab, Princeton, NJ 08543 USA
[2] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA
[3] MKS, Spectra Phys, Milpitas, CA 95035 USA
[4] Univ Rochester, Lab Laser Energet, 250 East River Rd, Rochester, NY 14623 USA
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 2023年 / 94卷 / 04期
关键词：
ELECTRON-DENSITY; LASER-ABLATION;
D O I：
10.1063/5.0131598
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We show through forward modeling calculations that streaked collective Thomson scattering measurements are feasible on laser-produced tin plasmas generated under conditions relevant for extreme ultraviolet lithography. Using a 532 nm probe laser beam, the feasibility of simultaneous measurements of electron plasma wave (EPW) and ion acoustic wave (IAW) spectra is investigated. Absolute photon counts for laser scattering off both waves are calculated. Probe laser electron heating and bremsstrahlung background radiation effects are accounted for. While a large spatiotemporal region can be successfully probed based on the IAW feature, only one measurement location can be accessed through the EPW as a result of the low signal to noise ratio. A portable/traveling tabletop system is proposed.
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页数：9
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