SIMULATION OF CAPACITIVELY COUPLED RF DISCHARGE IN ARGON

被引:0
|
作者
Lisovskiy, V. [1 ]
Dudin, S. [1 ]
Shakhnazarian, A. [1 ]
Platonov, P. [1 ]
Yegorenkov, V. [1 ]
机构
[1] Kharkov Natl Univ, Kharkiv, Ukraine
基金
新加坡国家研究基金会;
关键词
MODEL;
D O I
10.46813/2023-146-129
中图分类号
O57 [原子核物理学、高能物理学];
学科分类号
070202 ;
摘要
In this work, the axial profiles of the density of electrons and positive ions, the mean electron energy, the electric field strength, and the potential were obtained, both on average over the period and in dynamics. It was shown that argon discharges are dominated by ionization by electrons that gained energy by stochastic heating during the expansion of near-electrode sheaths. This ionization occurs in two pulses during one RF period. At low RF voltage between the electrodes, the role of Ohmic heating of electrons in the electric field in a quasi-neutral plasma increases, but the contribution of stochastic heating remains dominant. The time-averaged plasma potential was found to increase non-linearly with the RF voltage between the electrodes U-rf. It is shown that at low U-rf values (when the RF voltage approaches the discharge extinction curve), the average potential Phi can reach U-rf due to the axial redistribution of the instantaneous potential in the gap between the electrodes.
引用
收藏
页码:129 / 133
页数:5
相关论文
共 50 条
  • [41] Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge
    Zhang, Quan-Zhi
    Jiang, Wei
    Hou, Lu-Jing
    Wang, You-Nian
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (01)
  • [42] Time resolved electron density and temperature measurements on a capacitively coupled helium RF discharge
    Van de Sande, M.J.
    Deckers, R.H.M.
    Lepkojus, F.
    Buscher, W.
    Van der Mullen, J.J.A.M.
    Plasma Sources Science and Technology, 2002, 11 (04) : 466 - 475
  • [43] A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques
    Dinescu, G
    Mitu, B
    Aldea, E
    Dinescu, M
    VACUUM, 2000, 56 (01) : 83 - 86
  • [44] ON THE FUNCTIONALIZATION OF POLYPROPYLENE WITH CF4 PLASMA CREATED IN CAPACITIVELY COUPLED RF DISCHARGE
    Vesel, A.
    Mozetic, M.
    INFORMACIJE MIDEM-JOURNAL OF MICROELECTRONICS ELECTRONIC COMPONENTS AND MATERIALS, 2010, 40 (01): : 67 - 73
  • [45] Simulation of capacitively coupled single- and dual-frequency RF discharges
    Lee, JK
    Babaeva, NY
    Kim, HC
    Manuilenko, OV
    Shon, JW
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2004, 32 (01) : 47 - 53
  • [46] Two-dimensional fluid simulation of capacitively coupled RF electronegative plasmas
    Dong-A Univ, Pusan, Korea, Republic of
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 5 A (2874-2882):
  • [47] Discharge characteristics of an atmospheric-pressure capacitively coupled radio-frequency argon plasmas
    Li, Shou-Zhe
    Lim, Jin-Pyo
    Uhm, Han S.
    PHYSICS LETTERS A, 2006, 360 (02) : 304 - 308
  • [48] Temporal evolution of a capacitively coupled argon discharge due to the sputtering of an oxide layer on an aluminum electrode
    Qiu, Jie
    Li, Jiang-Tao
    Chen, Wen-Cong
    Wang, Zhen-Bin
    Liu, Fei-Xiang
    Pu, Yi-Kang
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2019, 28 (06):
  • [49] Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge
    Donko, Zoltan
    Hartmann, Peter
    Korolov, Ihor
    Schulenberg, David
    Rohr, Stefan
    Rauf, Shahid
    Schulze, Julian
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2023, 32 (06):
  • [50] Two-dimensional fluid simulation of capacitively coupled RF electronegative plasmas
    Chung, TH
    Meng, L
    Yoon, HJ
    Lee, JK
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (5A): : 2874 - 2882