Metastable argon atom kinetics in a low-pressure capacitively coupled radio frequency discharge

被引:11
|
作者
Donko, Zoltan [1 ]
Hartmann, Peter [1 ]
Korolov, Ihor [2 ]
Schulenberg, David [2 ]
Rohr, Stefan [2 ]
Rauf, Shahid [3 ]
Schulze, Julian [2 ]
机构
[1] Wigner Res Ctr Phys, Inst Solid State Phys & Opt, Konkoly Thege Miklos str 29-33, H-1121 Budapest, Hungary
[2] Ruhr Univ Bochum, Chair Appl Electrodynam & Plasma Technol, D-44780 Bochum, Germany
[3] Appl Mat Inc, 3333 Scott Blvd, Santa Clara, CA 95054 USA
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2023年 / 32卷 / 06期
关键词
CCP; metastable atoms; TDLAS measurement; PIC; MCC-fluid hybrid simulation; CROSS-SECTIONS; PARTICLE SIMULATION; FLUID SIMULATIONS; PLASMA; TEMPERATURE; CELL; EXCITATION; DENSITY; AR;
D O I
10.1088/1361-6595/acd6b5
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The kinetics of excited atoms in a low-pressure argon capacitively coupled plasma source are investigated by an extended particle-in-cell/Monte Carlo Collisions simulation code coupled with a diffusion-reaction-radiation code which considers a large number of excited states of Ar atoms. The spatial density distribution of Ar atoms in the 1s(5) state within the electrode gap and the gas temperature are also determined experimentally using tunable diode laser absorption spectroscopy. Processes involving the excited states, especially the four lower-lying 1s states are found to have significant effects on the ionization balance of the discharge. The level of agreement achieved between the computational and experimental results indicates that the discharge model is reasonably accurate and the computations based on this model allow the identification of the populating and de-populating processes of the excited states.
引用
收藏
页数:16
相关论文
共 50 条
  • [1] STUDY OF THE NEON DIELECTRIC BARRIER DISCHARGE ON A CAPACITIVELY COUPLED RADIO FREQUENCY AT A LOW PRESSURE WITH METASTABLE ATOM DENSITY: EFFECT OF THE PRESSURE
    Bouchikhi, A.
    UKRAINIAN JOURNAL OF PHYSICS, 2022, 67 (07): : 504 - 514
  • [2] Field probe for low-pressure capacitively coupled radio-frequency discharge plasmas
    Dyson, A
    Allen, JE
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2003, 14 (01) : 107 - 113
  • [3] The discharge characteristics of low-pressure capacitively coupled argon plasma with Langmuir probe
    Yin, Guiqin
    Gao, Shanshan
    Liu, Zhaohui
    Yuan, Qianghua
    PHYSICS LETTERS A, 2022, 426
  • [4] Fast modeling of the low-pressure capacitively coupled radio-frequency discharge based on the nonlocal approach
    Berezhnoi, SV
    Kaganovich, ID
    Tsendin, LD
    Schweigert, VA
    APPLIED PHYSICS LETTERS, 1996, 69 (16) : 2341 - 2343
  • [5] Electron stochastic heating in a capacitively coupled low-pressure argon rf-discharge
    Tatanova, M.
    Golubovskii, Yu B.
    Smirnov, A. S.
    Seimer, G.
    Basner, R.
    Kersten, H.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2009, 18 (02):
  • [6] SPATIAL AND TEMPORAL EMISSION-SPECTROSCOPY OF A RADIO-FREQUENCY CAPACITIVELY COUPLED LOW-PRESSURE OXYGEN DISCHARGE
    BARNES, RM
    WINSLOW, RJ
    JOURNAL OF PHYSICAL CHEMISTRY, 1978, 82 (17): : 1869 - 1875
  • [7] Discharge characteristics of an atmospheric-pressure capacitively coupled radio-frequency argon plasmas
    Li, Shou-Zhe
    Lim, Jin-Pyo
    Uhm, Han S.
    PHYSICS LETTERS A, 2006, 360 (02) : 304 - 308
  • [8] Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma discharges
    Wen, De-Qi
    Krek, Janez
    Gudmundsson, Jon Tomas
    Kawamura, Emi
    Lieberman, Michael A.
    Zhang, Peng
    Verboncoeur, John P.
    APPLIED PHYSICS LETTERS, 2023, 123 (26)
  • [9] Comparison of atmospheric-pressure helium and argon plasmas generated by capacitively coupled radio-frequency discharge
    Li, Shou-Zhe
    Lim, Jin-Pyo
    Kang, Jung G.
    Uhm, Han S.
    PHYSICS OF PLASMAS, 2006, 13 (09)
  • [10] Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge
    Bogaerts, A
    Yan, M
    Gijbels, R
    Goedheer, W
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (06) : 2990 - 3001