Negative Capacitance for Stabilizing the Logic State in a Tunnel Field-Effect Transistor

被引:4
|
作者
Dey, Koushik [1 ]
Das, Bikash [1 ]
Hazra, Pabitra Kumar [1 ]
Kundu, Tanima [1 ]
Naskar, Sanjib [2 ]
Das, Soumik [1 ]
Maity, Sujan [1 ]
Maji, Poulomi [1 ]
Karmakar, Bipul [1 ]
Paramanik, Rahul [1 ]
Datta, Subhadeep [1 ]
机构
[1] Indian Assoc Cultivat Sci IACS, Sch Phys Sci, Kolkata 700032, India
[2] Indian Assoc Cultivat Sci IACS, Cent Sci Serv CSS, Kolkata 700032, India
关键词
negative capacitance; field-effect transistor; 2D ferroelectric; TMDs; tunnel field-effect transistor; logic state; TRANSITION;
D O I
10.1021/acsanm.3c06311
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ferroelectric negative capacitance field-effect transistors, or FE-NCFETs, are promising device architectures for achieving improved performance in terms of hysteresis, on-off ratio, and power consumption. The study investigates the influence of negative capacitance (NC) on the transfer characteristics of van der Waals field-effect transistors below and above a critical voltage (V-th) on the heterophase of the CuInP2S6 (CIPS) gate ferroelectric. Notably, a less pronounced NC resulting from the spatial distribution of the ferroelectric and paraelectric phases plays a crucial role in stabilizing n-channel conductance by dual gate modulation. This results in the emergence of a nonvolatile logic state between the two binary states typical of conventional tunnel field-effect transistors (TFETs). Concerned study proposed NCTFETs based on ferroionic crystals as promising devices for generating a stable logic state below the coercive voltage. In addition, tunneling and voltage pinning effects play a key role for enhancement of the transistor's on-off ratio.
引用
收藏
页码:26405 / 26413
页数:9
相关论文
共 50 条
  • [31] Steep-Slope WSe2 Negative Capacitance Field-Effect Transistor
    Si, Mengwei
    Jiang, Chunsheng
    Chung, Wonil
    Du, Yuchen
    Alam, Muhammad A.
    Ye, Peide D.
    NANO LETTERS, 2018, 18 (06) : 3682 - 3687
  • [32] Analytical Model for a Tunnel Field-Effect Transistor
    Vandenberghe, William G.
    Verhulst, Anne S.
    Groeseneken, Guido
    Soree, Bart
    Magnus, Wim
    2008 IEEE MEDITERRANEAN ELECTROTECHNICAL CONFERENCE, VOLS 1 AND 2, 2008, : 902 - 907
  • [33] Tunneling Field-Effect Transistor: Capacitance Components and Modeling
    Yang, Yue
    Tong, Xin
    Yang, Li-Tao
    Guo, Peng-Fei
    Fan, Lu
    Yeo, Yee-Chia
    IEEE ELECTRON DEVICE LETTERS, 2010, 31 (07) : 752 - 754
  • [34] Proposal for Capacitance Matching in Negative Capacitance Field-Effect Transistors
    Agarwal, Harshit
    Kushwaha, Pragya
    Lin, Yen-Kai
    Kao, Ming-Yen
    Liao, Yu-Hung
    Dasgupta, Avirup
    Salahuddin, Sayeef
    Hu, Chenming
    IEEE ELECTRON DEVICE LETTERS, 2019, 40 (03) : 463 - 466
  • [35] Effect of shifted gate stack engineering over negative capacitance tunnel field effect transistor (NCTFET)
    Singh, Amandeep
    Sinha, Sanjeet Kumar
    Chander, Sweta
    ENGINEERING RESEARCH EXPRESS, 2022, 4 (03):
  • [36] Simulation-based study of negative-capacitance double-gate tunnel field-effect transistor with ferroelectric gate stack
    Liu, Chien
    Chen, Ping-Guang
    Xie, Meng-Jie
    Liu, Shao-Nong
    Lee, Jun-Wei
    Huang, Shao-Jia
    Liu, Sally
    Chen, Yu-Sheng
    Lee, Heng-Yuan
    Liao, Ming-Han
    Chen, Pang-Shiu
    Lee, Min-Hung
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (04)
  • [37] A FIELD-EFFECT TRANSISTOR WITH A NEGATIVE DIFFERENTIAL RESISTANCE
    KASTALSKY, A
    LURYI, S
    GOSSARD, AC
    HENDEL, R
    IEEE ELECTRON DEVICE LETTERS, 1984, 5 (02) : 57 - 60
  • [38] ZrOx Negative Capacitance Field-Effect Transistor with Sub-60 Subthreshold Swing Behavior
    Zhang, Siqing
    Liu, Huan
    Zhou, Jiuren
    Liu, Yan
    Han, Genquan
    Hao, Yue
    NANOSCALE RESEARCH LETTERS, 2021, 16 (01):
  • [39] Variation Caused by Spatial Distribution of Dielectric and Ferroelectric Grains in a Negative Capacitance Field-Effect Transistor
    Kao, Ming-Yen
    Sachid, Angada B.
    Lin, Yen-Kai
    Liao, Yu-Hung
    Agarwal, Harshit
    Kushwaha, Pragya
    Duarte, Juan Pablo
    Chang, Huan-Lin
    Salahuddin, Sayeef
    Hu, Chenming
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (10) : 4652 - 4658
  • [40] Negative-Capacitance Fin Field-Effect Transistor Beyond the 7-nm Node
    Chen, Kuan-Ting
    Qiu, Yu-Yan
    Tang, Ming
    Lee, Chia-Feng
    Dai, Yi-Lu
    Lee, Min-Hung
    Chang, Shu-Tong
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2018, 18 (10) : 6873 - 6878