Investigation of a Surface Layer Formed on Silica Glass as a Result of Mechanical-Chemical and Ionic Polishing

被引：0
|
作者：
Zolotarev, V. M. [1 ]
机构：
[1] St Petersburg Natl Univ Informat Technol Mech & O, St Petersburg 197101, Russia
来源：
OPTICS AND SPECTROSCOPY | 2022年 / 130卷 / 11期
关键词：
surface layer; silica glass; formation mechanism; mechanical-chemical and ionic polishing methods; OPTICAL-CONSTANTS; REFLECTION-SPECTROSCOPY; EXTREME-ULTRAVIOLET;
D O I：
10.1134/S0030400X22120050
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Optical parameters of a surface layer formed on silica glass in the process of polishing are studied. It is shown that the mechanisms of surface layer formation by mechanical-chemical and ionic polishing have much in common. In both cases, the appearance of a surface layer with a refractive index higher than that of the bulk glass is related to stretching and breaking of Si-O-Si bridging bonds due to hydrolysis during glass polishing. The hydrolysis of Si-O-Si bonds occurs with formation of Si-O and Si-OH groups, which leads to an increase in the refractive index of the surface layer.
引用
收藏
页码：573 / 584
页数：12
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