Investigation of a Surface Layer Formed on Silica Glass as a Result of Mechanical-Chemical and Ionic Polishing

被引：0
|
作者：
Zolotarev, V. M. [1 ]
机构：
[1] St Petersburg Natl Univ Informat Technol Mech & O, St Petersburg 197101, Russia
来源：
OPTICS AND SPECTROSCOPY | 2022年 / 130卷 / 11期
关键词：
surface layer; silica glass; formation mechanism; mechanical-chemical and ionic polishing methods; OPTICAL-CONSTANTS; REFLECTION-SPECTROSCOPY; EXTREME-ULTRAVIOLET;
D O I：
10.1134/S0030400X22120050
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Optical parameters of a surface layer formed on silica glass in the process of polishing are studied. It is shown that the mechanisms of surface layer formation by mechanical-chemical and ionic polishing have much in common. In both cases, the appearance of a surface layer with a refractive index higher than that of the bulk glass is related to stretching and breaking of Si-O-Si bridging bonds due to hydrolysis during glass polishing. The hydrolysis of Si-O-Si bonds occurs with formation of Si-O and Si-OH groups, which leads to an increase in the refractive index of the surface layer.
引用
收藏
页码：573 / 584
页数：12
相关论文
共 50 条
  • [1] Investigation of a Surface Layer Formed on Silica Glass as a Result of Mechanical-Chemical and Ionic Polishing
    V. M. Zolotarev
    Optics and Spectroscopy, 2022, 130 : 573 - 584
  • [2] Investigation of the Chemical Residuals on the Fused Silica during Chemical Mechanical Polishing
    Xu, Li
    Chen, Gaopan
    Luo, Haimei
    Shi, Xiaolei
    Luo, Guihai
    Pan, Guoshun
    CHEMISTRYSELECT, 2018, 3 (31): : 8930 - 8935
  • [3] Investigation of optimal chemical composition of cast aluminum alloys for vibrational mechanical-chemical polishing and deposition of protective and decorative coatings
    Ivanov, V. V.
    Popov, S. I.
    Kirichek, A. V.
    INTERNATIONAL CONFERENCE ON MECHANICAL ENGINEERING, AUTOMATION AND CONTROL SYSTEMS 2017, 2018, 327
  • [4] Electro-chemical mechanical polishing of copper and chemical mechanical polishing of glass
    Venkatesh, VC
    Izman, S
    Mahadevan, SC
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2004, 149 (1-3) : 493 - 498
  • [5] Study chemical reaction of –Si–OH surface layer by solid and ionic form to surface quality when polishing with chemical–mechanical slurry
    Duc L.A.
    Hieu P.M.
    Quang N.M.
    Journal of King Saud University - Engineering Sciences, 2024, 36 (01) : 1 - 8
  • [6] New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles
    Brugnoli, Luca
    Miyatani, Katsuaki
    Akaji, Masatoshi
    Urata, Shingo
    Pedone, Alfonso
    LANGMUIR, 2023, 39 (15) : 5527 - 5541
  • [7] Chemical Mechanical Polishing of Glass Disk Substrates: Preliminary Experimental Investigation
    Tian, Y. B.
    Ang, Y. J.
    Zhong, Z. W.
    Xu, H.
    Tan, R.
    MATERIALS AND MANUFACTURING PROCESSES, 2013, 28 (04) : 488 - 494
  • [8] Investigation on the complex interaction between particle and substrate in mechanical polishing of silica glass
    Han, Xuesong
    INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2016, 85 (9-12): : 2567 - 2575
  • [9] Investigation on the complex interaction between particle and substrate in mechanical polishing of silica glass
    Xuesong Han
    The International Journal of Advanced Manufacturing Technology, 2016, 85 : 2567 - 2575
  • [10] Chemical and mechanical techniques for polishing glass
    Sabia, Robert
    Stevens, Harrie J.
    Glass Researcher, 1999, 9 (01):
12345