Nanomechanical resonators fabricated by atomic layer deposition on suspended 2D materials

被引:2
|
作者
Liu, Hanqing [1 ]
Basuvalingam, Saravana B. [2 ]
Lodha, Saurabh [3 ]
Bol, Ageeth A. [4 ]
van der Zant, Herre S. J. [5 ]
Steeneken, Peter G. [1 ,5 ]
Verbiest, Gerard J. [1 ]
机构
[1] Delft Univ Technol, Dept Precis & Microsyst Engn, Mekelweg 2, NL-2628 CD Delft, Netherlands
[2] Eindhoven Univ Technol, Dept Appl Phys, POB 513, NL-5600 MB Eindhoven, Netherlands
[3] Indian Inst Technol, Dept Elect Engn, Mumbai 400076, India
[4] Univ Michigan, Dept Chem, 930 N Univ Ave, Ann Arbor, MI 48109 USA
[5] Delft Univ Technol, Kavli Inst Nanosci, Lorentzweg 1, NL-2628 CJ Delft, Netherlands
基金
荷兰研究理事会; 欧洲研究理事会;
关键词
nanomechanical resonator; atomic layer deposition; Q factor; resonance frequency; optomechanical drive; ELASTIC PROPERTIES; MOS2;
D O I
10.1088/2053-1583/acf58a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomic layer deposition (ALD), a layer-by-layer controlled method to synthesize ultrathin materials, provides various merits over other techniques such as precise thickness control, large area scalability and excellent conformality. Here we demonstrate the possibility of using ALD growth on top of suspended 2D materials to fabricate nanomechanical resonators. We fabricate ALD nanomechanical resonators consisting of a graphene/MoS2 heterostructure. Using atomic force microscope indentation and optothermal drive, we measure their mechanical properties including Young's modulus, resonance frequency and quality factor, showing a lower energy dissipation compared to their exfoliated counterparts. We also demonstrate the fabrication of nanomechanical resonators by exfoliating an ALD grown NbS2 layer. This study exemplifies the potential of ALD techniques to produce high-quality suspended nanomechanical membranes, providing a promising route towards high-volume fabrication of future multilayer nanodevices and nanoelectromechanical systems.
引用
收藏
页数:7
相关论文
共 50 条
  • [31] Structural Defects Modulate Electronic and Nanomechanical Properties of 2D Materials
    Tripathi, Manoj
    Lee, Frank
    Michail, Antonios
    Anestopoulos, Dimitris
    McHugh, James G.
    Ogilvie, Sean P.
    Large, Matthew J.
    Graf, Aline Amorim
    Lynch, Peter J.
    Parthenios, John
    Papagelis, Konstantinos
    Roy, Soumyabrata
    Saadi, M. A. S. R.
    Rahman, Muhammad M.
    Pugno, Nicola Maria
    King, Alice A. K.
    Ajayan, Pulickel M.
    Dalton, Alan B.
    ACS NANO, 2021, 15 (02) : 2520 - 2531
  • [32] Complex Materials by Atomic Layer Deposition
    Schwartzberg, Adam M.
    Olynick, Deirdre
    ADVANCED MATERIALS, 2015, 27 (38) : 5778 - 5784
  • [33] Atomic layer deposition on particulate materials
    van Ommen, J. R.
    Goulas, A.
    MATERIALS TODAY CHEMISTRY, 2019, 14
  • [34] Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics
    Lee, Jaebeom
    Ravichandran, Arul, V
    Mohan, Jaidah
    Cheng, Lanxia
    Lucero, Antonio T.
    Zhu, Hui
    Che, Zifan
    Catalano, Massimo
    Kim, Moon J.
    Wallace, Robert M.
    Venugopal, Archana
    Choi, Woong
    Colombo, Luigi
    Kim, Jiyoung
    ACS APPLIED MATERIALS & INTERFACES, 2020, 12 (32) : 36688 - 36694
  • [35] 2D FeSx Nanosheets by Atomic Layer Deposition: Electrocatalytic Properties for the Hydrogen Evolution Reaction
    Zazpe, Raul
    Pereira, Jhonatan Rodriguez
    Thalluri, Sitaramanjaneya M.
    Hromadko, Ludek
    Pavlinak, David
    Kolibalova, Eva
    Kurka, Michal
    Sopha, Hanna
    Macak, Jan M.
    CHEMSUSCHEM, 2023, 16 (11)
  • [36] 2D FeSx Nanosheets by Atomic Layer Deposition: Electrocatalytic Properties for the Hydrogen Evolution Reaction
    Zazpe, Raul
    Pereira, Jhonatan Rodriguez
    Thalluri, Sitaramanjaneya M.
    Hromadko, Ludek
    Pavlinak, David
    Kolibalova, Eva
    Kurka, Michal
    Sopha, Hanna
    Macak, Jan M.
    CHEMSUSCHEM, 2023,
  • [37] Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond
    Mattinen, Miika
    Leskela, Markku
    Ritala, Mikko
    ADVANCED MATERIALS INTERFACES, 2021, 8 (06):
  • [38] Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics
    Mattinen, Miika
    Popov, Georgi
    Vehkamaki, Marko
    King, Peter J.
    Mizohata, Kenichiro
    Jalkanen, Pasi
    Raisanen, Jyrki
    Leskela, Markku
    Ritala, Mikko
    CHEMISTRY OF MATERIALS, 2019, 31 (15) : 5713 - 5724
  • [39] Rugate notch filter fabricated by atomic layer deposition
    Li, Yanghui
    Shen, Weidong
    Hao, Xiang
    Lang, Tingting
    Jin, Shangzhong
    Liu, Xu
    APPLIED OPTICS, 2014, 53 (04) : A270 - A275
  • [40] Nanomechanical properties of platinum thin films synthesized by atomic layer deposition
    Mamun, M. A.
    Gu, D.
    Baumgart, H.
    Elmustafa, A. A.
    SURFACE & COATINGS TECHNOLOGY, 2015, 265 : 185 - 190