Nanomechanical resonators fabricated by atomic layer deposition on suspended 2D materials

被引:2
|
作者
Liu, Hanqing [1 ]
Basuvalingam, Saravana B. [2 ]
Lodha, Saurabh [3 ]
Bol, Ageeth A. [4 ]
van der Zant, Herre S. J. [5 ]
Steeneken, Peter G. [1 ,5 ]
Verbiest, Gerard J. [1 ]
机构
[1] Delft Univ Technol, Dept Precis & Microsyst Engn, Mekelweg 2, NL-2628 CD Delft, Netherlands
[2] Eindhoven Univ Technol, Dept Appl Phys, POB 513, NL-5600 MB Eindhoven, Netherlands
[3] Indian Inst Technol, Dept Elect Engn, Mumbai 400076, India
[4] Univ Michigan, Dept Chem, 930 N Univ Ave, Ann Arbor, MI 48109 USA
[5] Delft Univ Technol, Kavli Inst Nanosci, Lorentzweg 1, NL-2628 CJ Delft, Netherlands
基金
荷兰研究理事会; 欧洲研究理事会;
关键词
nanomechanical resonator; atomic layer deposition; Q factor; resonance frequency; optomechanical drive; ELASTIC PROPERTIES; MOS2;
D O I
10.1088/2053-1583/acf58a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomic layer deposition (ALD), a layer-by-layer controlled method to synthesize ultrathin materials, provides various merits over other techniques such as precise thickness control, large area scalability and excellent conformality. Here we demonstrate the possibility of using ALD growth on top of suspended 2D materials to fabricate nanomechanical resonators. We fabricate ALD nanomechanical resonators consisting of a graphene/MoS2 heterostructure. Using atomic force microscope indentation and optothermal drive, we measure their mechanical properties including Young's modulus, resonance frequency and quality factor, showing a lower energy dissipation compared to their exfoliated counterparts. We also demonstrate the fabrication of nanomechanical resonators by exfoliating an ALD grown NbS2 layer. This study exemplifies the potential of ALD techniques to produce high-quality suspended nanomechanical membranes, providing a promising route towards high-volume fabrication of future multilayer nanodevices and nanoelectromechanical systems.
引用
收藏
页数:7
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