L-Shaped Double Gate Bipolar Impact Ionization MOSFET Based Energy Efficient Leaky Integrate and Fire Neuron for Spiking Neural Network

被引:1
|
作者
Sarkhel, Saheli [1 ]
Kumari, Tripty [2 ]
Saha, Priyanka [3 ]
机构
[1] NSEC, Dept Elect & Commun Engn, Kolkata 700152, India
[2] IIT Patna, Dept Elect Engn, Patna 801103, Bihar, India
[3] CV Raman Global Univ, Dept Elect & Commun Engn, Bhubaneswar 752054, India
关键词
Neurons; BiCMOS integrated circuits; Logic gates; Impact ionization; Charge carrier processes; MOSFET; Electric potential; leaky integrate and fire; spiking neural network; L-shaped gate;
D O I
10.1109/TNANO.2023.3322880
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, an L-shaped double gate bipolar impact ionization MOSFET (L-DG BIMOS) is proposed and demonstrated as an ultra-low energy artificial leaky integrate and fire (LIF) neuron for spiking neural network. The L-shaped double gate structure offers a higher rate of impact ionization (II) essential for triggering LIF action and hence can efficiently be applicable to mimic a biological neuron. Using a well-calibrated 2D TCAD tool, the functioning of the proposed device as an LIF neuron is manifested by exhibiting a low threshold voltage of 0.2 V to fire a spike, reduced breakdown voltage of 0.68 V and 0.1050 pJ of energy per spike, making the device more energy efficient as compared to conventional neurons. In addition, the spiking frequency of L-DG BIMOS is calculated to be in the gigahertz (Gz) range when the drain is biased at 1.5 V, which is much higher than biological neurons.
引用
收藏
页码:673 / 678
页数:6
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