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L-Shaped Double Gate Bipolar Impact Ionization MOSFET Based Energy Efficient Leaky Integrate and Fire Neuron for Spiking Neural Network
被引:1
|作者:
Sarkhel, Saheli
[1
]
Kumari, Tripty
[2
]
Saha, Priyanka
[3
]
机构:
[1] NSEC, Dept Elect & Commun Engn, Kolkata 700152, India
[2] IIT Patna, Dept Elect Engn, Patna 801103, Bihar, India
[3] CV Raman Global Univ, Dept Elect & Commun Engn, Bhubaneswar 752054, India
关键词:
Neurons;
BiCMOS integrated circuits;
Logic gates;
Impact ionization;
Charge carrier processes;
MOSFET;
Electric potential;
leaky integrate and fire;
spiking neural network;
L-shaped gate;
D O I:
10.1109/TNANO.2023.3322880
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this article, an L-shaped double gate bipolar impact ionization MOSFET (L-DG BIMOS) is proposed and demonstrated as an ultra-low energy artificial leaky integrate and fire (LIF) neuron for spiking neural network. The L-shaped double gate structure offers a higher rate of impact ionization (II) essential for triggering LIF action and hence can efficiently be applicable to mimic a biological neuron. Using a well-calibrated 2D TCAD tool, the functioning of the proposed device as an LIF neuron is manifested by exhibiting a low threshold voltage of 0.2 V to fire a spike, reduced breakdown voltage of 0.68 V and 0.1050 pJ of energy per spike, making the device more energy efficient as compared to conventional neurons. In addition, the spiking frequency of L-DG BIMOS is calculated to be in the gigahertz (Gz) range when the drain is biased at 1.5 V, which is much higher than biological neurons.
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页码:673 / 678
页数:6
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