Effect of annealing temperature on multiferroic properties of Bi0.85Nd0.15FeO3 thin films prepared by sol-gel method

被引：0
|
作者：
GOTO Takashi [1 ]
机构：
[1] Institute for Materials Research,Tohoku University,Sendai 980-8577,Japan
来源：
Science China(Technological Sciences) | 2010年 / 06期
关键词：
Bi0.85Nd0.15FeO3 thin films; sol-gel method; annealing temperature; ferroelectric properties; ferromagnetic properties;
D O I：
暂无
中图分类号：
TG156.2 [退火];
学科分类号：
摘要：
Bi0.85Nd0.15FeO3 films were prepared on Pt/Ti/SiO2/Si substrate by a sol-gel method,and annealed at different temperatures.The effect of annealing temperature on the crystal structure,dielectric,ferroelectric,and ferromagnetic properties was investigated.When the Bi0.85Nd0.15FeO3 films were annealed at 490-600°C,the single phase was obtained.Bi0.85Nd0.15FeO3 film annealed at 600°C showed good multiferroic properties with εr of 145 (at 1 MHz),Ms of 44.8 emu/cm3,and 2Pr of 16.6 μC/cm2.
引用
收藏
页码：1572 / 1575
页数：4
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