Analysis of Dark Signal Degradation Caused by 1 MeV Neutron Irradiation on Backside-Illuminated CMOS Image Sensors

被引:0
|
作者
LIU Bingkai [1 ,2 ,3 ]
LI Yudong [1 ,2 ]
WEN Lin [1 ,2 ]
ZHOU Dong [1 ,2 ]
FENG Jie [1 ,2 ]
ZHANG Xiang [1 ,2 ,3 ]
CAI Yulong [1 ,2 ,3 ]
FU Jing [1 ,2 ,3 ]
GUO Qi [1 ,2 ]
机构
[1] Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences
[2] Xinjiang Key Laboratory of Electronic Information Material and Device
[3] University of Chinese Academy of Sciences
基金
中国科学院西部之光基金; 中国国家自然科学基金;
关键词
D O I
暂无
中图分类号
TP212 [发送器(变换器)、传感器];
学科分类号
080202 ;
摘要
The purpose of this work is to investigate the influence of the epitaxial layer thickness of Backside-illuminated CMOS image sensors(BSI CISs) on dark signal behaviors. BSI CISs with the high quantum efficiency and sensitivity were irradiated by 1 MeV neutron up to the fluences of 10;cm;. The displacement damage induced variations of the mean dark signal,Dark signal nonuniformity(DSNU), dark signal spikes and Random telegraph signal(RTS) on the different epitaxial layer thicknesses are analyzed. The experimental results show that there is no obvious correlation between the degradations of dark signal parameters and the epitaxial layer thickness, suggesting that the electric-optical performance of BSI CISs can be improved by optimizing the epitaxial layer thickness.
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页码:180 / 184
页数:5
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