Influence of laser conditioning on defects of HfO2 monolayer films

被引：0
|
作者：
李笑 [1 ,2 ]
赵元安 [1 ]
刘晓凤 [1 ,2 ]
邵建达 [1 ]
范正修 [1 ]
机构：
[1] Key Laboratory of High Power Laser Materials,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences
[2] Graduate University of Chinese Academy of Sciences
来源：
Chinese Optics Letters | 2010年 / 8卷 / 06期
关键词：
than;
D O I：
暂无
中图分类号：
O484 [薄膜物理学];
学科分类号：
080501 ; 1406 ;
摘要：
The influence of laser conditioning on defects of HfOmonolayer films prepared by electron beam evaporation (EBE) is investigated utilizing the spot-size effect of the laser-induced damage.It is found that the laser-induced damage threshold of HfOmonolayer films can be increased by a factor of 1.3-1.6.It is also found that the defects with low threshold can be removed by laser conditioning and defects with higher threshold may be removed partially.
引用
收藏
页码：615 / 617
页数：3
相关论文
共 50 条
  • [21] Influence of the standing wave electric field pattern on the laser damage resistance of HfO2 thin films
    Alvisi, M
    Di Giulio, M
    Perrone, MR
    Protopapa, ML
    Scaglione, S
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2000, PROCEEDINGS, 2001, 4347 : 102 - 107
  • [22] Optical and electrical characteristics of HfO2/Cu40Ag60/HfO2 films prepared by pulsed laser deposition
    Cao, Guohua
    Niu, Yifan
    Wei, Zhifei
    Qiu, Shengli
    Zong, Haitao
    Yin, Yuehong
    Chen, Xu
    Zhang, Baoqing
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2023, 129 (03):
  • [23] Optical and electrical characteristics of HfO2/Cu40Ag60/HfO2 films prepared by pulsed laser deposition
    Guohua Cao
    Yifan Niu
    Zhifei Wei
    Shengli Qiu
    Haitao Zong
    Yuehong Yin
    Xu Chen
    Baoqing Zhang
    Applied Physics A, 2023, 129
  • [24] Electron paramagnetic resonance characterization of defects in HfO2 and ZrO2 powders and films
    Barklie, R. C.
    Wright, Sandra
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (01): : 317 - 320
  • [25] Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping
    Park, Tae Joo
    Kim, Jeong Hwan
    Jang, Jae Hyuck
    Lee, Choong-Ki
    Na, Kwang Duk
    Lee, Sang Young
    Jung, Hyung-Suk
    Kim, Miyoung
    Han, Seungwu
    Hwang, Cheol Seong
    CHEMISTRY OF MATERIALS, 2010, 22 (14) : 4175 - 4184
  • [26] Structural and electrical characteristics of HfO2 films fabricated by pulsed laser deposition
    Ikeda, H
    Goto, S
    Honda, K
    Sakashita, M
    Sakai, A
    Zaima, S
    Yasuda, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (4B): : 2476 - 2479
  • [27] Relation between laser damage and defects of HfO2/SiO2 HR coatings
    Hu, Jian-Ping
    Chen, Mei
    Fu, Xiong-Ying
    Cai, Lin
    Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2001, 13 (05): : 529 - 532
  • [28] Influence of composition and seed dimension on the structure and laser damage of nodular defects in HfO2/SiO2 high reflectors
    Wei, Chaoyang
    Yi, Kui
    Fan, Zhengxiu
    Shao, Jianda
    APPLIED OPTICS, 2012, 51 (28) : 6781 - 6788
  • [29] Influence of standing-wave electric field pattern on the laser damage resistance of HfO2 thin films
    Protopapa, ML
    Alvisi, M
    De Tomasi, F
    Di Giulio, M
    Perrone, MR
    Scaglione, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (03): : 643 - 650
  • [30] Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors
    Liu, Jie
    Li, Xu
    Yu, Zhenkun
    Cui, Hui
    Zhang, Weili
    Zhu, Meiping
    Yi, Kui
    PACIFIC RIM LASER DAMAGE 2013: OPTICAL MATERIALS FOR HIGH POWER LASERS, 2013, 8786
12345