Multi-channel micro neural probe fabricated with SOI

Silicon-on-insulator(SOI) substrate is widely used in micro-electro-mechanical systems(MEMS).With the buried oxide layer of SOI acting as an etching stop,silicon based micro neural probe can be fabri-cated with improved uniformity and manufacturability.A seven-record-site neural probe was formed by inductive-coupled plasma(ICP) dry etching of an SOI substrate.The thickness of the probe is 15 μm.The shaft of the probe has dimensions of 3 mm×100 μm×15 μm with typical area of the record site of 78.5 μm2.The impedance of the record site was measured in-vitro.The typical impedance characteris-tics of the record sites are around 2 MΩ at 1 kHz.The performance of the neural probe in-vivo was tested on anesthetic rat.The recorded neural spike was typically around 140 μV.Spike from individual site could exceed 700 μV.The average signal noise ratio was 7 or more.